화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2008년 가을 (10/09 ~ 10/10, 일산킨텍스)
권호 33권 2호
발표분야 기능성 고분자
제목 Synthesis and characterization of novel photopatternable organosilicate polymers
초록 We present the synthesis and characterization of novel chemically amplified photoresists based on organosilicate polymers. The photopatternable copolymers were synthesized from three distinct monomers: 4-triethoxysilanylphenol, 1,2-bis(triethoxylsilyl)ethane (BTESE), and 1-tert-butoxy-4-triethoxysilylmethyl-benzene. The optical and mechanical properties of the imaged films were investigated. Feature size up to 5 μm in the positive tone resist has been achieved by the exposure of 365 nm UV light. Adhesion between resist film and substrate was successfully improved by the incorporation of 4-triethoxysilanylphenol monomer. These novel copolymers with both photopatternability and good physical properties are anticipated to make a potential contribution as planarization and barrier layer materials in optoelectronic devices.
저자 서지연, 심재환, 윤도영
소속 서울대
키워드 organosilicate; photoresist
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