||Cloud point of the amine mixture with the fluoride group surfactant in supercritical carbon dioxide has been investigated. Amine mixture was used as additives for the supercritical carbon dioxide, because only CO2 could not remove completely photo resist used for semiconductor manufacturing process. The cloud point is a necessary factor for Supercritical CO2 Resist Removal (SCORR) process. The cloud points were measured using a high pressure variable-volume view cell. All systems exhibited a lower critical solution temperature (LCST) phase behavior and became one-phase in carbon dioxide in the range of 313.15 to 353.15 K at less than 30 MPa.