화학공학소재연구정보센터
학회 한국화학공학회
학술대회 2018년 봄 (04/25 ~ 04/27, 창원컨벤션센터)
권호 24권 1호, p.776
발표분야 재료
제목 3D Feature profile simulation for oxide etching under fluorocarbon/oxygen mixture plasma
초록 Recently, plasma etching for sub-10nm device is emerging as one of the challenges in semiconductor manufacturing process. Lack of basic understanding of most of these processes makes it difficult to develop next-generation process due to their complexity. As a part of an effort to overcome these limitations, we have developed a 3D feature profile simulator strongly coupled with Zero-D bulk plasma module. In this work, the 3D feature profile simulator is integrated with a reasonable plasma database for bulk and surface reactions for fluorocarbon/oxygen mixture plasma etching.  The effect of oxygen in fluorocarbon plasma is highlighted in 3D feature profile simulation for contact hole etch, and verified with experimental data.
저자 박재형1, 유혜성1, 육영근1, 유동훈2, 임연호1
소속 1전북대, 2경원테크
키워드 화공소재 전반
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