화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2016년 봄 (04/06 ~ 04/08, 대전컨벤션센터)
권호 41권 1호
발표분야 기능성 고분자
제목 Development of a low-foaming resist stripper containing block copolymer
초록 Dry film resist is a photosensitive film which is most commonly used in manufacturing of printed circuit board. Stripper is an organic solution which removes the residual resist after forming Cu patterns. In the industry, stripper spraying method is commonly used to remove the resist. However, foams are generated during the strip process. In addition, dissolved binder polymers in the stripper make the foam height increase. When the concentration of dissolved binder polymer increased, the foam height increased. These foams make the pressure of the spray lower, decreasing the strip efficiency in facilities. In this work, we introduced block copolymers as an antifoamer into the stripper in order to lower the foam height and increase the strip efficiency. When the certain block copolymer was used in the stripper, the foam height decreased nearly to zero. The foam height was examined by Bartsch method. Furthermore, fluorescence microscope was used to evaluate the strip efficiency.
저자 천지훈, 정경옥, 김진백
소속 한국과학기술원
키워드 Dry film resist; stripper; block copolymer
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