화학공학소재연구정보센터
학회 한국고분자학회
학술대회 2015년 가을 (10/06 ~ 10/08, 대구컨벤션센터(EXCO))
권호 40권 2호
발표분야 고분자합성
제목 Reducing Line Edge Roughness of PS-b-PMMA pattern using hydrogen bonding located at the interface of the block copolymer microdomains
초록 Sharp interface between two blocks in block copolymer nano pattern is one of the important issues because of strong demand in industrial applications to nano-lithography and nano-patterning. We utilized hydrogen bonding between N-(4-aminomethyl-benzyl)-4-hydroxymethyl-bezamide (BA) and urea (U) at the interface of polystyrene-block-poly(methyl methacrylate) copolymer (PS-PMMA). For this purpose, we synthesized PS by ATRP method, then the end group was converted to amino group. Then, it was reacted with BA, followed by reaction with 4-pentynoic acid, resulting in alkyne-terminated group (PS-U-BA-alkyne). Finally, through the azide-alkyne click reaction between PS-U-BA-alkyne and azide-terminated PMMA prepared by anionic polymerization and end functionalization, PS-U-BA-PMMA was synthesized. We investigated, via small angle X-ray scattering and scanning electron microscopy, the phase behavior and line edge roughness of PS-U-BA-PMMA and compared with general PS-b-PMMA.
저자 김진곤, 곽종헌, 박지철, 장상신, 이규성
소속 포항공과대
키워드 Block copolymer; PS-b-PMMA; Hydrogen bonding
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