화학공학소재연구정보센터
Applied Surface Science, Vol.257, No.24, 10737-10742, 2011
Structural characterization of Ni and Ni/Ti ohmic contact on n-type 4H-SiC
In this study, we report on the structural characterization of Ni layer and Ni/Ti bilayer contacts on n-type 4H-SiC. The resulting Ni-silicides and the redistribution of carbon, after annealing at 950 degrees C, in the Ni/SiC and the Ni/Ti/SiC contacts are particularly studied by Rutherford Backscattering Spectrometry (RBS) at E(alpha) = 3.2 MeV, nuclear reaction analysis (NRA) at E(d) = 1 MeV, scanning electron microscopy (SEM) and Energy Dispersive X-ray Spectrometry (EDS) techniques. (C) 2011 Elsevier B. V. All rights reserved.