화학공학소재연구정보센터
Langmuir, Vol.28, No.5, 2448-2454, 2012
Electrically Conducting Nanopatterns Formed by Chemical e-Beam Lithography via Gold Nanoparticle Seeds
We report the formation of thiol nanopatterns on SAM covered silicon wafers by converting sulfonic acid head groups via e-beam lithography. These thiol groups act as binding sites for gold nanoparticles, which can be enhanced to form electrically conducting nanostructures. This approach serves as a proof-of-concept for the combination of top-down and bottom-up processes for the generation of electrical devices on silicon.