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Journal of the Electrochemical Society, Vol.159, No.6, F157-F165, 2012
Electrochemistry of Deposition of Boron from KCl-KF-KBF4 Melts: Voltammetric Studies on Platinum Electrode
Electrochemistry of deposition of boron on a platinum electrode from KCl (81.54 mol%)-KF (18.45 mol%)-KBF4 (1.6 to 7.73 x 10(-4) mol cm(-3)) melts was studied by cyclic voltammetry, chronoamperometry and convolution voltammetry. These studies were carried out over the temperature range 1073-1123 K. Boron-containing complexes are shown to reduce quasireversibly (scan rate: < 0.1 V s(-1)) and irreversibly (scan rate: > 0.1 V s(-1)) through a single-step three-electron process (B(III) + 3e -> B). The transfer and diffusion coefficients were measured at different KBF4 concentrations in the melt over the temperature range 1073-1123 K by using cyclic voltammetry, convolution voltammetry and chronoamperometry.