화학공학소재연구정보센터
Applied Surface Science, Vol.256, No.24, 7668-7671, 2010
A study of AFM-based scratch process on polycarbonate surface and grating application
We report on the possibility of applying atomic force microscope (AFM) lithography to draw micro/nanostructures on the surface of a polycarbonate (PC) substrate. We also fabricated a grating structure on the PC surface using the scratch method. An AFM silicon tip coated with a diamond layer was utilized as a cutting tool to scratch the surface of the sample. In order to obtain pattern depth deeper than the control method of interaction force, we used a scanner movement method which the sample scanner moves along the Z-axis. A grating of 100 mu m x 150 mu m was fabricated by the step and repeat method wherein the sample stage is moved in the direction of the XY-axis. The period and the depth of the grating are 500 and 50 nm, respectively. Light of 632.8 nm wavelength was diffracted on the surface of the PC substrate. (C) 2010 Elsevier B.V. All rights reserved.