Applied Surface Science, Vol.256, No.16, 4977-4983, 2010
Low energy repetitive miniature plasma focus device as high deposition rate facility for synthesis of DLC thin films
Diamond-like carbon (DLC) films were deposited on Si (1 0 0) substrate using a low energy (219 J) repetitive (1 Hz) miniature plasma focus device. DLC thin film samples were deposited using 10, 20, 50, 100 and 200 focus shots with hydrogen as filling gas at 0.25 mbar. The deposited samples were analyzed by XRD, Raman Spectroscopy, SEM and XPS. XRD results exhibited the diffraction peaks related to SiO2, carbon and SiC. Raman studies verified the formation amorphous carbon with D and G peaks. Corresponding variation in the line width (FWHM) of the D and G positions along with change in intensity ratio (I-D/I-G) in DLC films was investigated as a function of number of deposition shots. XPS confirmed the formation sp(2) (graphite like) and sp(3) (diamond like) carbon. The cross-sectional SEM images establish the 220 W repetitive miniature plasma focus device as the high deposition rate facility for DLC with average deposition rate of about 250 nm/min. (C) 2010 Elsevier B.V. All rights reserved.