화학공학소재연구정보센터
Journal of Vacuum Science & Technology B, Vol.27, No.3, 1093-1096, 2009
Inductively coupled plasma etching in fabrication of 2D InP-based photonic crystals
The authors developed an inductively coupled plasma etching process for the fabrication of hole-type photonic crystals in InP. The etching was performed at 70 degrees C using BCl3/Cl-2 chemistries. A high etch rate of 1.4 mu m/min was obtained for 200 nm diameter holes. The process also yields nearly cylindrical hole shape with a 10.8 aspect ratio and more than 85 degrees straightness of the smooth sidewall. Surface-emitting photonic crystal laser and edge emitting one were demonstrated in the experiments.