화학공학소재연구정보센터
Applied Surface Science, Vol.255, No.10, 5186-5190, 2009
Influence of direct current plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper films
Physical vapor processes using glow plasma discharge are widely employed in microelectronic industry. In particular magnetron sputtering is a major technique employed for the coating of thin films. This paper addresses the influence of direct current (DC) plasma magnetron sputtering parameters on the material characteristics of polycrystalline copper (Cu) thin films coated on silicon substrates. The influence of the sputtering parameters including DC plasma power and argon working gas pressure on the electrical and structural properties of the thin Cu films was investigated by means of surface profilometer, four-point probe and atomic force microscopy. (C) 2008 Elsevier B.V. All rights reserved.