화학공학소재연구정보센터
Thin Solid Films, Vol.516, No.5, 856-858, 2008
Desorption process of copper chlorides from copper surface
Gaseous copper chlorides can be employed as precursors in a newly developed Cu-CVD method called metal chloride reduction-chemical vapor deposition (MCR-CVD). More than one species exists in the gas phase of copper chloride. We studied the gas phase composition of copper chlorides generated by etching of copper surface by electron impact-mass spectrometry. The composition of gaseous species can change because of gas phase reactions. After desorbing from the copper surface, copper chloride reached equilibrium composition immediately. (c) 2007 Published by Elsevier B.V.