화학공학소재연구정보센터
Macromolecular Rapid Communications, Vol.25, No.1, 326-329, 2004
High-throughput chemical vapor deposition system and thin-film silicon library
Thin-film Si materials library were fabricated rapidly on glass substrates using the combinatorial hot-wire CVD technique. We found that the films with high hydrogen dilution become microcrystalline Si, and the films with no and low hydrogen dilution remain in the amorphous Si structure. We also found that the ratio of hydrogen to silane (R) is a good measure of the structure change.