화학공학소재연구정보센터
Advanced Materials, Vol.17, No.1, 39-39, 2005
Photolithographic patterning of ring-opening metathesis catalysts on silicon
Ruthenium-based metathesis catalysts have been successfully covalently bound to a thermal oxide layer on a Si(100) wafer. Selective inactivation of the catalyst is achieved via exposure to UV light using standard photolithographic techniques. Subsequent exposure of the wafer to a suitable monomer results in the formation of a patterned polymeric film that is covalently attached to the oxide layer.