화학공학소재연구정보센터
Applied Surface Science, Vol.253, No.2, 646-650, 2006
Nanoimprint lithography using IR laser irradiation
A new technique called "infrared laser-assisted nanoimprint lithography" was utilised to soften the thermoplastic polymer material mR-I 8020 during nanoimprint lithography. A laser setup and a sample holder with pressure and temperature control were designed for the imprint experiments. The polymer was spin coated onto crystalline Si < 1 1 1 > substrates. A prepatterned Si < 1 1 1 > substrate, which is transparent for the CO2 laser radiation, was used as an imprint stamp as well. It was shown, that the thermoplastic resist mR-I 8020 could be successfully imprinted using the infrared CW CO2 laser irradiation (lambda = 10.6 mu m). The etching rate of the CO2 laser beam irradiated mR-I 8020 resist film under O-2 RF (13.56 MHz) plasma treatment and during O-2 reactive ion beam etching was investigated as well. (c) 2006 Elsevier B.V. All rights reserved.