화학공학소재연구정보센터
Applied Surface Science, Vol.185, No.1-2, 134-139, 2001
Stress and morphological development of US and ZnS thin films during the SILAR growth on (100)GaAs
Cadmium sulfide and zinc sulfide films were grown on (100)GaAs substrate by successive ionic layer adsorption and reaction (SILAR) technique from aqueous precursor solutions at room temperature and normal pressure. The stress development of the thin films was characterized by laser interferometry as a function of the thickness of the films. The morphology and roughness of the films were monitored by atomic force microscopy. Additionally the crystallinity and crystallite size were analyzed by X-ray diffraction and composition by electron spectroscopy for chemical analysis. The CdS thin films had significantly higher stress level and also better crystallinity compared with ZnS thin films. Both films were polycrystalline and cubic, but the CdS thin films followed the substrate (100) orientation, whereas the ZnS films were (111) orientated. The roughness vs. film thickness curves of both films followed each other in shape, but the US films consisted of smaller particles.