화학공학소재연구정보센터
Applied Chemistry, Vol.9, No.1, 37-40, May, 2005
Titanium Ethoxide에 의한 스테인레스에 증착된 티타늄 산화막 특성
The Characteristics of Titanium Oxide Films Deposited on Stainless by Titanium Ethoxide
In this paper, we study the characteristics of titanium oxide films deposited on stainless by titanium ethoxide. The titanium oxide films deposited on stainless has only Ti-O band at 400 ~ 1000 cm-1 range. The deposition rate of titanium oxide films gradually increased with deposition time and RF power, it was decreased, however, after the condition of 250 watt, 30min and 40 min by the ablation and the etching.