화학공학소재연구정보센터
Journal of the Korean Industrial and Engineering Chemistry, Vol.14, No.5, 605-608, August, 2003
화학 증폭형 포토레지스트의 감도 증진을 위한 산 증식제로 시클로헥산디올의 p-스티렌술폰산 에스테르 유도체에 관한 연구
p-Styrenesulfonate Derivatives of Cyclohexandiol as Acid Amplifiers to Enhance Photosensitivity of Chemically Amplified Photoresists
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초록
본 연구에서는 1-hydroxy-4-p-styrenesulfonyloxy cyclohexane (1), 1,4-di-p-styrene-sulfonyloxy cyclohexane (2), 그리고 1-p-styrenesulfonyloxy-4-tosyloxy cyclohexane (3)을 산 증식제로 합성하고 그 성능을 평가하였다. 이러한 산 증식제들(1~3)은 레지스트 공정온도에 대하여 충분한 열적 안정성을 나타내었다. 또한 산 증식제를 사용한 경우에 광산 발생제만 사용한 poly(tert-butyl methacrylate) 필름에 비교하여 2배에서 5배 정도의 감도 증진이 일어나 광화상 제조에 효과적으로 응용할 수 있음을 확인하였다.
In this research, we synthesized and evaluated 1-hydroxy-4-p-styrenesulfonyloxy cyclohexane, 1,4-di-p-styrenesulfonyloxy cyclohexane, and 1-p-styrenesulfonyloxy-4-tosyloxy cyclohexane as novel acid amplifiers. These acid amplifiers showed reasonable thermal stability for resist processing temperature. As estimated by the sensitivity curve, all the acid amplifiers were 2 ~ 5 times more sensitive than poly(tert-butyl methacrylate) film in the presence of a photoacid generator; and therefore, these can provided practical applicability in photoimaging.
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