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Journal of the Electrochemical Society, Vol.150, No.4, F61-F66, 2003
Self-organized nanomolecular films on low-dielectric constant porous methyl silsesquioxane at room temperature
By dipping in a silanisation solution, a hydrophobic self-organized nanomolecular film (SOM) was successfully grown on the surface of dry-etched porous methyl silsesquioxane (DE-PMSQ). The reaction was spontaneous at room temperature. The moisture adsorption on the DE-PMSQ was avoided and the surface of the SOM/DE-PMSQ was rather smooth. Leakage current and dielectric constant measurements of DE-PMSQ and SOM/DE-PMSQ samples also showed consistent behavior. As a result, it is promising to use the low-k PMSQ as an inter-metal dielectric with hydrophobic SOM grown on DE-PMSQ. (C) 2003 The Electrochemical Society.