화학공학소재연구정보센터
Thin Solid Films, Vol.249, No.2, 250-253, 1994
Characterization of Wnx Metallization Prepared by Ion-Implantation of Nitrogen
The thermal stability of the sheet resistance of WNx metallization film prepared by ion implantation of nitrogen into sputtered tungsten film was investigated in correlation with microstructural changes examined by X-ray and transmission electron microscopy. The effect of microstructural properties on the sheet resistivity of the metallization film was demonstrated.