Langmuir, Vol.12, No.15, 3666-3670, 1996
CF4 Plasma Treatment of Asymmetric Polysulfone Membranes
CF4 glow discharge treatment; of asymmetric polysulfone membranes has been investigated by X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and gas permeability measurements. Oxygen and nitrogen gas permeability and permselectivity through the polysulfone substrate are found to be strongly influenced by the plasma-processing parameters.
Keywords:ATOMIC-FORCE MICROSCOPY;SURFACE FLUORINATION;COMPOSITE MEMBRANES;GAS-SEPARATION;TRANSPORT-PROPERTIES;POLYMER CHEMISTRY;GLOW-DISCHARGE;FILMS;DEPOSITION;MIXTURES