화학공학소재연구정보센터
Journal of Vacuum Science & Technology B, Vol.17, No.6, 3310-3313, 1999
Nanofabrication with deep-ultraviolet lithography and resolution enhancements
This work explores the nanofabrication potential of resolution-enhanced deep-ultraviolet lithography. We combine strong phase-shift methods with fabrication-based enhancements to produce silicon structures in the deep sub-100 nm regime; Limits on resolution and pitch with these methods are considered.