화학공학소재연구정보센터
Journal of Vacuum Science & Technology B, Vol.15, No.4, 1159-1162, 1997
Gallium Desorption Behavior at AlGaAs/GaAs Heterointerfaces During High-Temperature Molecular-Beam Epitaxy
A Monte Carlo simulation study is performed to investigate the Ga desorption behavior during AlGaAs-on-GaAs heterointerface formation by molecular beam epitaxy. The transients in the Ga desorption rate upon opening the Al shutter are shown to be associated with the concurrent reduction in the V/III flux ratio. Monte Carlo simulations employing a constant V/III flux ratio yield a "steplike" variation in the Ga desorption rate with the resulting interfaces closer in abruptness to the ideal AlGaAs-on-GaAs interface. Further details on the stoichiometry of the interface and its relationship with predicted Ga desorption profiles is presented.