화학공학소재연구정보센터
Clean Technology, Vol.28, No.1, 63-78, March, 2022
첨단 전자산업 폐수처리시설의 Water Digital Twin(I): e-ASM 모델 개발과 Digital Simulation 구현
Water Digital Twin for High-tech Electronics Industrial Wastewater Treatment System (I): e-ASM Development and Digital Simulation Implementation
E-mail:
초록
첨단 전자산업 폐수 처리시설에서 발생되는 유기 폐수는 고농도의 유기물질 및 20가지 이상의 유독 난분해성 물질을 포함하 고 있으며, 이를 효율적으로 처리하는 것은 첨단 전자산업의 당면 과제이다. 따라서, 첨단 전자산업 유기폐수 처리시설을 CPS (Cyber physical system)상 Water digital twin으로 구축하여 COD (Chemical Oxygen Demand), TN (Total Nitrogen), TP (Total Phosphorous) 및 TMAH (Tetramethylammonium hydroxide) 등 유기 오염물질의 제거 효율 평가가 가능한 전자산업 폐수 특화 모델 개발이 필요하다. 본 연구에서는 첨단전자산업 유기폐수 제거 메커니즘에 대한 분해 미생물의 성장과 사멸의 이론적인 반응속도식에 기반한 첨단 전자산업 폐수 특화 활성슬러지 모델(Electronics industrial wastewater activated sludge model, e-ASM)을 개발하였다. 개발한 e-ASM은 전자산업 폐수처리공정에서 발생하는 유기물 산화, 질산화, 및 탈질화 과정뿐만 아 니라 TMAH 등 난분해성 유기물질의 분해과정 중 발생하는 질산화미생물의 저해(Inhibition) 작용 등 복잡한 생물학적 분해 메커니즘이 모사 가능하다. 이를 활용하여 실제 전자산업 유기폐수 처리시설을 Water Digital Twin으로 구현하여 CPS (Cyber physical system) 상에서 전자산업 폐수처리장에 폐수 유입 성상에 따라 공정 모델링, 유출수 예측, 공법 선정, 설계 효율 평가 등 다양한 목적으로 활용될 수 있다.
Electronics industrial wastewater treatment facilities release organic wastewaters containing high concentrations of organic pollutants and more than 20 toxic non-biodegradable pollutants. One of the major challenges of the fourth industrial revolution era for the electronics industry is how to treat electronics industrial wastewater efficiently. Therefore, it is necessary to develop an electronics industrial wastewater modeling technique that can evaluate the removal efficiency of organic pollutants, such as chemical oxygen demand (COD), total nitrogen (TN), total phosphorous (TP), and tetramethylammonium hydroxide (TMAH), by digital twinning an electronics industrial organic wastewater treatment facility in a cyber physical system (CPS). In this study, an electronics industrial wastewater activated sludge model (e-ASM) was developed based on the theoretical reaction rates for the removal mechanisms of electronics industrial wastewater considering the growth and decay of micro-organisms. The developed e-ASM can model complex biological removal mechanisms, such as the inhibition of nitrification micro-organisms by non-biodegradable organic pollutants including TMAH, as well as the oxidation, nitrification, and denitrification processes. The proposed e-ASM can be implemented as a Water Digital Twin for real electronics industrial wastewater treatment systems and be utilized for process modeling, effluent quality prediction, process selection, and design efficiency across varying influent characteristics on a CPS.
  1. Park HW, J. of the KSME., 57(8), 24 (2015)
  2. Kim SJ, Korean J. Constr. Eng. Manag., 18(3), 19 (2017)
  3. National Academy of Engineering of Korea, “A study on the Competencies and Education Required for Chemical Engineering Engineers in the Era of the 4th Industrial Revolution,” 1-15 (2018).
  4. Kim MS, KIDIS(43), 3 (2020)
  5. Lee EM, KIDIS(20), 52 (2012)
  6. Ministry of Trade, Industry and Energy, “Korean-semiconductor strategy to realize a comprehensive semiconductor power nation,” 13 (2021).
  7. Ministry of Environment, “2020 Generation and Treatment of industrial wastewater,” 1-608 (2020).
  8. Lee JS, Kim SJ, Gil DS, “Treatment system according to wastewater characteristics discharged from each process of semiconductor facilities,” K.R. Patent No. 10-2241014 (2020).
  9. Kim JH, Jun SJ, KIC News, 14(5), 13 (2011)
  10. Heo YT, “A Study for optimum treatment of TN wastewater including TMAH in LCD industry,” Graduate School of Industry, Kyungbook National University Daegu, 13-24 (2011).
  11. National Institute of Environmental Research, “Guidelines on Best Available Techniques for Environmental Pollution Prevention and Integrated Management in Semiconductor Manufacturing Industry,” 1-570 (2020).
  12. Kim MK, “Study on Phosphorus Removal and Denitrification of Etchant Wastewater,” M.Sc. Dissertation. Myongji University Graduate School: Environmental Energy Engineering, 33-35 (2014).
  13. Kang CK, “Technological consideration on the domestic production of high quality recycled semiconductor wastewater for industrial purpose,” M.Sc. Dissertation. Major Environ. Eng. Dep. Environ. Eng. Grad. Sch. Environ. Public Heal. Youngnam University, 45-50 (2017).
  14. He SY, Lin YH, Hou KY, Hwang SCJ, Bioresour. Technol., 102(10), 5609 (2011)
  15. Eskenazi B, Gold EB, Lasley BL, Samuels SJ, Hammond SK, Wight S, Schenker MB, Am. J. Ind. Med., 28(6), 833 (1995)
  16. Henze M, Gujer W, Mino T, van Loosdrecht MC, “Activated sludge models ASM1, ASM2, ASM2d and ASM3”. IWA publishing. (2000).
  17. Yoo CK, Kim MH, Korean Chem. Eng. Res., 46(3), 610 (2008)
  18. Choi TH, “A Study on the Optimization of Sewage Treatment Plant Using ASM No.2d Simulation,” Ph.D. Dissertation. Dep. Environ. Eng. Grad. Sch. Suwon Univ., 17-19 (2019).
  19. Lee H, Yi J, Clean Technol., 4(1), 6 (1998)
  20. Jeon ET, “A Study on the Decision of Process for Nitrogen Removal in Semiconductor Rinsing Wastewater,” M.Sc. Dissertation, Hanyang University Graduate School: Environmental Energy Engineering, 1-46 (2011).
  21. Park JY, Kim SJ, Choi KK, Lee YW, Lee JJ, Hwang KW, Lee WK, Environ. Eng. Res., 2 (2007)
  22. Lin SH, Kiang CD, J. Hazard. Mater., 97(1-3), 159 (2003)
  23. Lee GC, Park YJ, Kang KH, Jung MO, Ryu DH, Jung SS, Lee W, J. Korean Soc. Environ. Eng., 43(5), 367 (2021)
  24. Che TK, Ni CH, Chan YC, Lu MC, Water Sci. Technol., 51(6-7), 411 (2005)
  25. Chuang SH, Chang WC, Huang YH, Tseng CC, Tai CC, Bioresour. Technol., 102(9), 5461 (2011)
  26. Huang H, Liu J, Zhang P, Zhnag D, Gao F, Chem. Eng. J., 307, 696 (2017)
  27. Chung S, Chung J, Chung C, J. Water Process Eng., 37(4), 101 (2020)
  28. Fukushima T, Whang LM, Chen PC, Putri DW, Chang MY, Wu YJ, Lee YC, Bioresour. Technol., 141, 131 (2013)
  29. Kang CK, “Technological consideration on the domestic production of high quality recycled semiconductor wastewater for industrial purpose”,
  30. Chae S, J. KSET., 16(4), 269 (2015)
  31. Ryu HD, Lim CS, Kang MK, Lee SI, J. Hazard. Mater., 221, 248 (2012)
  32. An MK, Woo GN, Kim JH, Kang MK, Ryu HD, Lee SI, J. KSWE., 25(6), 916 (2009)
  33. An BM, Jeong JY, Kim JH, Park JY, KSCE J., 9 (2012)
  34. Chen SY, Lu LA, Lin JG, Bioresour. Technol., 210, 88 (2016)
  35. Innocenzi V, Zueva S, Prisciandaro M, De Michelis I, Di Renzo A, Di Celso GM, Vegliò F, J. Water Process Eng., 31, 100780 (2019)
  36. Ferella F, Innocenzi V, Zueva S, Corradini V, Ippolito NM, Birloaga IP, Vegliò F, Sustainability, 11(14), 3923 (2019)
  37. Heo SK, Nam KJ, Loy-Benitez, Yoo CK, IEEE Trans. Ind. Informatics, 17(10), 6925 (2021)
  38. Cho B, J. Korean Soc. Ind. Convergence, 16(2), 35 (2013)
  39. Jeong GT, Park SH, Park JH, Lim ET, Bang SH, Park DH, KSBB J., 24(3), 296 (2009)
  40. Bowker RPG, Stensel DH, “Design Manual Phosphorus Removal,” EPA, 125-126 (1987).
  41. Park H, “Improvement of the advanced treatment process in the present sewage treatment plants in Korea,” M.Sc. Dissertation. Grad. Sch. Public Heal. Yonsei University, 38-47 (2009).
  42. Choi HY, Park DW, J. Korean Soc. Environ. Eng., 42(10), 443 (2020)
  43. Liu B, Yoshinaga K, Wub J, Chen W, Terashima M, Goel R, Pangallo D, Yasui H, Biochem. Eng. J., 114, 42 (2016)
  44. Wu YJ, Irmayani L, Setiyawan AA, Whang LM, Chemosphere, 258, 3 (2020)
  45. Cheng H, Liu C, Lei Y, Chiu Y, Mangalidan J, Wu C, Wu Y, Whang L, Chemosphere, 236, 2 (2019)
  46. Park SJ, Yoon TJ, Bae JH, Seo HJ, Park HJ, Process Biochem., 36(6), 579 (2001)
  47. Park YS, “Study on Computer Simulations of Wastewater Treatment Process for Recovery of Isopropyl Alcohol (IPA) from Wafer Cleaning,” Ph.D. Dissertation. Dep. Environ. Eng. Grad. Sch. Suwon University, 1-129 (2017).
  48. Hockenbury MR, Grady CPL, J. Water Pollut. Control Fed, 49(5), 768 (1977)
  49. Steffan RJ, McClay K, Vainberg S, Condee CW, Zhang D, Appl. Environ. Microbiol., 63(11), 4216 (1997)
  50. Weon K, “A Study on the Pre-treatment of Biological Processes for High-concentration Semiconductor Cleaning Wastewater,”
  51. Michelis DI, Renzo DA, Saraullo M, Veglio F, “Kinetic Study of Aerobic Degradation of Tetramethylammonium Hydroxide (Tmah) Waste Produced in Electronic Industries,”
  52. Lei C, Whang L, Chen P, Lei C, Whang L, Chen P, Chemosphere, 81(1), 57 (2010)
  53. Hayes AC, Liss SN, Allen DG, Appl. Environ. Microbiol., 76(16), 5423 (2010)
  54. Geng Y, Deng Y, Chen F, Jin H, Tao K, Hou T, Prep. Biochem. Biotechnol., 45(5), 491 (2015)
  55. Lu C, Chang K, Hsu S, Process Biochem., 39(12), 1849 (2004)
  56. Raghuvanshi S, Gupta S, J. Biotechnol. Biomater., 13(2), 3 (2013)
  57. Carrero-Colón M, Nakatsu CH, Konopka A, Appl. Environ. Microbiol., 72(5), 3175 (2006)