Thin Solid Films, Vol.638, 354-360, 2017
Deposition of silicon oxycarbide thin films from an organosilicon source for polycarbonate glazing
To enhance the abrasion resistance of polycarbonate used to replace glass, a silicon oxycarbide thin film was deposited at <100 degrees C using a slot antenna electron cyclotron resonance plasma enhanced chemical vapor deposition system and an organosilicon source. The thin film deposition rate, which varied as a function of microwave power and whether Ar or O-2 was used to form the plasma, was above 500 nm/min even at 2 Pa, and reached 1 mu m/min as the microwave power increased. The transmittance of visible light was over 90% after thin film deposition, indicating performance similar to that of glass. The Taber abrasiontest showed that the Mazes of the thin films were under 5%, which indicates better performance than the siloxane-based wet coating sample (Momentive, AS4700) and the commercial hard plasma coating product LEXAN MR-10. Furthermore, the thin film deposited at 1.7 kW exhibited similar abrasion resistance to that of glass. In addition, adhesion improved significantly when consecutive, minute-long 1.7 kW Ar and 02 plasma surface treatments were performed before the depositions. (C) 2017 Published by Elsevier B.V.