화학공학소재연구정보센터
Applied Surface Science, Vol.422, 452-455, 2017
Mechanism of anisotropic etching on diamond (111) surfaces by a hydrogen plasma treatment
The surface morphology of (111) diamond after hydrogen plasma treatment was studied in detail by atomic force microscopy. As a result, we clearly showed that the hydrogen plasma treatment formed atomically flat diamond (111) surfaces due to its anisotropic etching. Elucidation of the diamond etching mechanism by hydrogen plasma is important for understanding and controlling diamond growth via plasma-enhanced chemical vapor deposition. In this study, we discussed the origin of anisotropic etching by hydrogen plasma. (C) 2017 Elsevier B.V. All rights reserved.