화학공학소재연구정보센터
Thin Solid Films, Vol.635, 27-31, 2017
Decomposition processes of photoresist polymers by H atoms produced on hot wire surfaces
Mass spectrometry was used to identify the decomposition products of two typical photoresist polymers, Novolak and polymethylmethacrylate, by H atoms produced on hot wire surfaces. The production of CH4 and CO was confirmed for both polymers. Other possible products are C3H8, C4H10 or C4H3, and some esters such as CH3COOC2H5. The production of CO2, C2H4, C2H6, alcohols, and aromatics are minor. The possible decomposition mechanisms are discussed on the basis of density functional calculations of the energetics. (C) 2016 Elsevier B.V. All rights reserved.