화학공학소재연구정보센터
Applied Chemistry, Vol.4, No.2, 113-116, November, 2000
감지 소자로의 응용 - 티타늄 실리사이드의 광학적 특성에 관한 연구
Studies on The Optical Properties of Titanium Silicide
Titanium silicide thin films which can apply to infrared-ray sensor were manufactured by a-Si:H/Ti/Si(100) thin film (A process), Ti/a-Si:H/Si(100) thin film (B process), fabricated by dilute gas (H2) Ti/a-Si:H/Si(100) thin film (C process) with annealing processes. In the particularly, we studied the applicable capability for near infrared-ray sensor and ascertained the effect of grain size and morphology to band-gap and the number of defect. From the correlation between band-gap and the number of defect, we will be interpreted the process condition that showed specific band-gap.