화학공학소재연구정보센터
Molecular Crystals and Liquid Crystals, Vol.388, 531-536, 2002
Surface modification of carbonaceous thin films by NF3 plasma and their effects on electrochemical properties
Carbonaceous thin films were prepared by plasma-assisted chemical vapor deposition. Surface of resultant films were treated by NF3 plasma at room temperature. From Raman spectra, crystallinity of sample remained almost unchanged by the surface treatment. The reduction current at 0.6 V vs. Li/Li+ in the cyclic voltammograms at the 1st cycle decreased with increasing the flow rate of NF3 . This result indicates that fluorine atoms bonded to carbon atoms play an important role in decreasing the side reaction at the 1st reduction process.