화학공학소재연구정보센터
Korean Journal of Materials Research, Vol.12, No.1, 82-88, January, 2002
전해 크롬도금 대체용으로서의 CrC 스퍼터링에 관한 연구
A study of CrC Sputtering as an Alternative Method for Cr Electroplating
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Chromium carbide films were deposited on high speed steels using a Cr_3C_2$ target by magnetron sputtering. Effects of the deposition parameters (power, Ar pressure and substrate temperature) on deposition rates and surface roughnesses of the films were investigated. The morphologies of those films were characterized by scanning electron microscopy and atomic force microscopy. The grain size of the samples deposited using dc-power is larger than that using equivalent rf-power. The hardness of the sample increases with increasing rf-power, whereas the elastic modulus nearly does not change with rf-power. The optimum sputter deposition conditions for chromium carbide on high speed steels in the corrosion resistance aspect were found to be the rf-power with small roughness.
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