화학공학소재연구정보센터
Korean Journal of Chemical Engineering, Vol.32, No.2, 199-201, February, 2015
Effect of chemical mechanical treatment on the optoelectronic properties in CMOS image sensor
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This paper presents the effect focal length variation by controlling chemical mechanical polishing (CMP) processes on the CIS optical performance. White sensitivity was drastically increased, and saturation signal variation and dead zone deviation were reduced. These experimental results showed that controlled focal length was able to increase CIS optoelectronic performance.
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