화학공학소재연구정보센터
Materials Science Forum, Vol.439, 277-281, 2003
Plasma model in aluminum nano-films
The mode of electromagnetic response of aluminum nano-films has been suggested by meaning of electromagnetic wave reflectance, transmittance and carrier density of the films. The carrier density of the films and dependence of their plasma frequency on the film thickness have been obtained. On the other hand, the dependence of absorptance on the frequency of electromagnetic wave field has been set up by using the measured reflectance and transmittance, which provides relationship between plasma frequency and film thickness. Both plasma frequency and film thickness proved plasma resonance.