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Proceedings of the 3rd International Conference on Microelectronics and Plasma Technology (ICMAP 2011), Dalian, China Preface [Anonymous] |
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Lubricating layer formed on porous anodic alumina template due to pore effect at water lubricated sliding and its properties Lee GS, Cho DH, Kim JS, Kim H, Choi YC, Bu SD, Lee YZ |
7 - 11 |
Effect of pulsed bias on TiO2 thin films prepared on silicon by arc ion plating and simulation of pulsed plasma sheath dynamics Zhang M, Liu L, Yang XX, Xu FF, Lin GQ, Dong C |
12 - 16 |
An ultra-thin Shadow Mask Plasma Display Panel Tu Y, Yang LL, Jin Y, Li QF, Zhang X, Wang BP, Tolner H |
17 - 21 |
The microstructure and optical properties of p-type microcrystalline silicon thin films characterized by ex-situ spectroscopic ellipsometry Zhang H, Zhang XD, Hou GF, Wei CC, Sun J, Geng XH, Xiong SZ, Zhao Y |
22 - 26 |
Rapid plasma treatment of polyimide for improved adhesive and durable copper film deposition Usami K, Ishijima T, Toyoda H |
27 - 29 |
Initial transient status during silicon thin film deposition under high pressure Xu SZ, Zhang XD, Ren HZ, Wei CC, Zhao Y |
30 - 33 |
Performance of organic field effect transistors with high-k gate oxide after application of consecutive bias stress Lee S, Choi C, Lee K, Cho JH, Ko KY, Ahn J |
34 - 37 |
Electron number and electron temperature evolution in the initial discharge phase of a shadow mask plasma display panel Zhang PP, Tu Y, Tolner H, Yang LL |
38 - 41 |
Modeling of an inductively-coupled Cl-2/Ar plasma using neural network Kim M, Jang H, Lee YH, Kwon KH, Park KB |
42 - 44 |
The electrical and structural properties of HfO2/SrTiO3 stacked gate dielectric with TiN metal gate electrode Choi C, Choi R |
45 - 49 |
Low defect interface study of intrinsic layer for c-Si surface passivation in a-Si:H/c-Si heterojunction solar cells Kim S, Dao VA, Shin C, Cho J, Lee Y, Balaji N, Ahn S, Kim Y, Yi J |
50 - 53 |
Optimal indium tin oxide layer as anti reflection coating for crystalline silicon solar cell with shallow emitter Ryu K, Lee YJ, Ju M, Choi H, Kim B, Lee J, Oh W, Choi K, Balaji N, Yi J |
54 - 59 |
Thermal stability of AgXCu1-X alloys and Pt capping layers for GaN vertical light emitting diodes Kim SH, Kim TH, Bae JW, Yeom GY |
60 - 64 |
Radio-frequency thermal plasma synthesis of nano-sized indium zinc tin oxide powders with reduced indium content Lee MY, Kim JS, Seo JH |
65 - 68 |
Film-type single axis tactile sensor with various thicknesses using nitrile butadiene rubber Kim S, Kim BC, Koo JC, Choi HR, Moon H |
69 - 72 |
Effects of anode buffer layers on the properties of organic solar cells Kim KH, Gong SC, Chang HJ |
73 - 77 |
A bilayer diffusion barrier of Ru/WSixNy for advanced Cu interconnects Eom TK, Sari W, Cheon T, Kim SH, Kim WK |
78 - 82 |
Self-consistent simulation study on magnetized inductively coupled plasma for 450 mm semiconductor wafer processing Lee HJ, Kim YG |
83 - 88 |
Etching characteristics of silicon oxide using amorphous carbon hard mask in dual-frequency capacitively coupled plasma Lee JH, Kwon BS, Lee NE |
89 - 93 |
Wear and corrosion behaviors of Ti6Al4V alloy biomedical materials by silver plasma immersion ion implantation process Liu HX, Xu Q, Zhang XW, Wang CQ, Tang BY |
94 - 97 |
Carrier charging effect of V3Si nanocrystals floating gate memory structure Kim D, Lee DU, Lee HJ, Kim EK |
98 - 101 |
Resistive switching effect for ZnO hybrid memory with metal-oxide nanocrystals Lee DU, Kim EK, Cho WJ, Kim YH, Im H |
102 - 106 |
Highly efficient carbon nanotube growth on plasma pretreated stainless steel substrates Shin EC, Jeong GH |
107 - 111 |
Tribological properties of a-C:W film deposited by radio frequency magnetron Co-sputtering method Park YS, Park Y, Jung H, Jung TH, Lim DG, Choi WS |
112 - 114 |
The enhanced two-photon-excited fluorescence of CdSe quantum dots on the surface of au island films from surface Plasmon resonance Yi J, Han XT, Chen XL, Liu CX, An WY, Dong X, Liu ML, An LM, Luo YM |
115 - 118 |
Light extraction efficiency improvement in GaN-based blue light emitting diode with two-dimensional nano-cavity structure Cho JY, Hong SH, Byeon KJ, Lee H |
119 - 122 |
Effect of Al incorporation on the performance and reliability of p-type metal-oxide-semiconductor field effect transistors Heo YU, Jang TY, Kim D, Chang JS, Nguyen MC, Hasan M, Yang H, Jeong JK, Choi R, Choi C |
123 - 127 |
Characterization of CuInS2 thin films prepared by aerosol jet deposition Fan R, Kim DC, Jung SH, Um JH, Lee WI, Chung CW |
128 - 131 |
Bone like apatite formation on modified Ti surfaces with COOH, NH2, and OH functional groups by plasma polymerization Ko YM, Lee K, Kim BH |
132 - 136 |
Optical wave microphone measurement during laser ablation of Si Mitsugi F, Ide R, Ikegami T, Nakamiya T, Sonoda Y |
137 - 140 |
Low temperature growth of nanoblade In2O3 thin films by plasma enhanced chemical vapor deposition: Morphology control and lithium storage properties Zheng J, Yang R, Lou Y, Li W, Li XG |
141 - 145 |
An overview of diagnostic methods of low-pressure capacitively coupled plasmas Liu YX, Jiang W, Li XS, Lu WQ, Wang YN |
146 - 149 |
Plasma-enhanced atomic layer deposition of Cu-Mn films with formation of a MnSixOy barrier layer Moon DY, Han DS, Park JH, Shin SY, Park JW, Kim BM, Cho JY |
150 - 154 |
Biocompatibility of plasma polymerized sandblasted large grit and acid titanium surface Jung SC, Lee K, Kim BH |
155 - 157 |
Abrupt changes in neon discharge plasma detected via the optogalvanic effect Han XML, Blosser MC, Misra P, Chandran H |
158 - 162 |
Effect of deposition time and potential on the nucleation and growth of nickel nano particles on nitrogen doped diamond-like carbon thin film Jin C, Zeng A, Cho SJ, Nam SH, Seo HO, Kim YD, Boo JH |
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Photoconductivity of reduced graphene oxide and graphene oxide composite films Liang HF, Ren W, Su JH, Cai CL |
168 - 171 |
High-performance InGaP/GaAs superlattice-emitter bipolar transistor with multiple S-shaped negative-differential-resistance switches under inverted operation mode Tsai JH, Huang CH, Lour WS, Chao YT, Ou-Yang JJ, Jhou JC |
172 - 175 |
An InP/InGaAs metamorphic delta-doped heterojunction bipolar transistor with high current gain and low offset voltage Tsai JH, Lour WS, Chao YT, Ye SS, Ma YC, Jhou JC, Wu YR, Ou-Yang JJ |
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Plasma-etching fabrication and properties of black silicon by using sputtered silver nanoparticles as micromasks Bi YM, Su XD, Zou S, Xin Y, Dai ZH, Huang J, Wang XS, Zhang LJ |
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Influence of Ar/H-2 ratio on the characteristics of phosphorus-doped hydrogenated nanocrystalline silicon films prepared by electron cyclotron resonance plasma-enhanced chemical vapor deposition Zhang XY, Wu AM, Shi SF, Qin FW, Bian JM |
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Comparisons of the electrical characteristics by impedance matching conditions on the E-H and H-E transition and the hysteresis of inductively coupled plasma Lee HC, Chung CW |
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Color tunable white organic light-emitting devices with a hybrid 2-methyl-9,10-di(2-naphthyl)anthracene small molecule/poly(2-methoxy-5-(2-ethyhexoxy)-1,4-phenylenevinylene) polymer emitting layer Jeon YP, Choo DC, Kim TW |
193 - 196 |
Organic light-emitting devices with an n-type bis(ethylenedithio)-tetrathiafulvalene-doped 4,7-diphenyl-1,10-phenanthroline electron transport layer operating at low voltage Lee KS, Kim DH, Lee DU, Kim TW |
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Numerical investigation of plasma recovery in plasma source ion implantation Chung KJ, Choe JM, Kim GH, Hwang YS |
201 - 205 |
Investigation on the control of silicon whisker generation during dichlorosilane-based WSi deposition process Choi H, Oh M, Kim J, Kim J, Yang JC, Lee S, Lee SW, Kim T |
206 - 211 |
SF6 arc plasma simulation and breakdown performance prediction using computational fluid dynamics and arc modeling Kim YJ, Lee JC |
212 - 215 |
Stability of a-InGaZnO thin film transistor under pulsed gate bias stress Seo SB, Jeon JH, Park HS, Choe HH, Seo JH, Park SHK |
216 - 221 |
High density plasma reactive ion etching of CoFeB magnetic thin films using a CH4/Ar plasma Kim EH, Lee TY, Min BC, Chung CW |
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Influence of oxidation treatment on ballistic electron surface-emitting display of porous silicon Du WT, Zhang XN, Zhang YJ, Wang WJ, Duan XT |
226 - 228 |
The atmospheric pressure air plasma jet with a simple dielectric barrier Chen LW, Wei Y, Zuo X, Cong J, Meng YD |
229 - 234 |
Inductively coupled plasma reactive ion etching of IrMn magnetic thin films using a CH4/O-2/Ar gas Lee TY, Kim EH, Chung CW |
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Effect of the high vacuum seasoning process on poly (4-vinyl phenol) as Organic Gate Dielectric in all solution-processed organic thin-film transistors Kim D, Kim H, So H, Lee YU, Hong M |
239 - 244 |
Atomistic simulations of diamond-like carbon growth Joe M, Moon MW, Lee KR |
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Selective etching of GaAs over Al0.2Ga0.8As semiconductor in pulsed DC BCl3/SF6 plasmas Shin JY, Choi KH, Noh KH, Park DK, Sohn KY, Cho GS, Song HJ, Lee JW, Pearton SJ |
249 - 252 |
Textured surface ZnO:B/(hydrogenated gallium-doped ZnO) and (hydrogenated gallium-doped ZnO)/ZnO:B transparent conductive oxide layers for Si-based thin film solar cells Yan CB, Chen XL, Wang F, Sun J, Zhang DK, Wei CC, Zhang XD, Zhao Y, Geng XH |
253 - 256 |
Influence of radical power on the electrical and optical properties of ZnO:N films grown by metal-organic chemical vapor deposition with N2O plasma doping source Sun JC, Bian JM, Wang Y, Zhang SL, Wang YX, Feng QJ, Liang HW, Du GT |
257 - 260 |
Removal of bisphenol A in water using an integrated granular activated carbon preconcentration and dielectric barrier discharge degradation treatment Tang SF, Lu N, Li J, Wu Y |
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The influence of air on streamer propagation in atmospheric pressure cold plasma jets Liu FC, Zhang DZ, Wang DZ |
265 - 269 |
Dual-power electrodes atmospheric pressure argon plasma jet: Effect of driving frequency (60-130 kHz) on discharge characteristics Qian MY, Fan QQ, Ren CS, Wang DZ, Nie QY, Zhang JL, Wen XQ |
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Chemically-modified graphene sheets as an active layer for eco-friendly metal electroplating on plastic substrates Oh JS, Hwang T, Nam GY, Hong JP, Bae AH, Son SI, Lee GH, Sung HK, Choi HR, Koo JC, Nam JD |