화학공학소재연구정보센터

Thin Solid Films

Thin Solid Films, Vol.515, No.11 Entire volume, number list
ISSN: 0040-6090 (Print) 

In this Issue (48 articles)

4527 - 4537 Simulation of growth dynamics in atomic layer deposition. Part I. Amorphous films
Nilsen O, Karlsen OB, Kjekshus A, Fjellvag H
4538 - 4549 Simulation of growth dynamics in atomic layer deposition. Part II. Polycrystalline films from cubic crystallites
Nilsen O, Karlsen OB, Kjekshus A, Fjellvag H
4550 - 4558 Simulation of growth dynamics in atomic layer deposition. Part III. Polycrystalline films from tetragonal crystallites
Nilsen O, Karlsen OB, Kjekshus A, Fjellvag H
4559 - 4564 Electrochemical investigation and characterization of thin-film porosity
Sittner F, Ensinger W
4565 - 4569 Influence of aluminum nitride interlayers on crystal orientation and piezoelectric property of aluminum nitride thin films prepared on titanium electrodes
Kamohara T, Akiyama M, Ueno N, Nonaka K, Kuwano N
4570 - 4579 Characterization of asymmetric rhombohedral twin in epitaxial alpha-Cr2O3 thin films by X-ray and electron diffraction
Mandar H, Uustare T, Aarik J, Tarre A, Rosental A
4580 - 4587 Structural and electrical properties of room temperature pulsed laser deposited and post-annealed thin SrRuO3 films
Gautreau O, Harnagea C, Normandin F, Veres T, Pignolet A
4588 - 4595 Complex electrical (impedance/dielectric) properties of electroceramic thin films by impedance spectroscopy with interdigital electrodes
Kidner NJ, Meier A, Homrighaus ZJ, Wessels BW, Mason TO, Garboczi EJ
4596 - 4602 Characterization of the silicon oxide thin films deposited on polyethylene terephthalate substrates by radio frequency reactive magnetron sputtering
Lin MC, Tseng CH, Chang LS, Wuu DS
4603 - 4608 Preparation of micropatterned poly(silsesquioxane) thin films using adamantylphenol molecules
Cha BJ, Choi YJ, Kim B, Kim H
4609 - 4613 Crystallization of chemically vapor deposited molybdenum and mixed tungsten/molybdenum oxide films for electrochromic application
Gesheva KA, Cziraki A, Ivanova T, Szekeres A
4614 - 4618 Lithium cobalt oxide thin films deposited at low temperature by ionized magnetron sputtering
Chiu KF
4619 - 4623 Structural and optical properties of wurtzite InN grown on Si(111)
Ji XH, Lau SP, Yang HY, Zhang QY
4624 - 4628 Preparation and characterization of ultra-thin sol-gel films
Shapiro L, Marx S, Mandler D
4629 - 4635 Nanowire array fabricated by Al-Ge phase separation
Fukutani K, Ishida Y, Tanji K, Den T
4636 - 4639 Pulsed laser deposition of crystalline ZrC thin films
Craciun V, Craciun D, Howard JM, Woo J
4640 - 4648 Hemispherical and diffuse reflectance and transmittance of a slightly inhomogeneous film bounded by rough, unparallel interfaces
Nichelatti E, Montecchi M, Montereali RM
4649 - 4661 Bis-(4-(2-pyridylmethyleneiminophenyl))disulfide - A chelating ligand capable of self assembly on gold surface and its complexes with M(BF4)(2) and M(ClO4)(2); M=CO, Cu and Ni. Experimental and theoretical study
Beloglazkina EK, Majouga AG, Zyk NV, Rakhimov RD, Yaminsky IV, Gorelkin PV, Kiselev GA, Kutateladze AG
4662 - 4665 Screening effect in contactless electroreflectance spectroscopy observed for AlGaN/GaN heterostructures with two dimensional electron gas
Motyka M, Kudrawiec R, Syperek M, Misiewicz J, Rudzinski M, Hageman PR, Larsen PK
4666 - 4669 A modified Wenzel model for hydrophobic behavior of nanostructured surfaces
Han TY, Shr JF, Wu CF, Hsieh CT
4670 - 4680 Electronic and thermal reaction pathways in the synchrotron radiation-excited modification and epitaxy of silicon-based materials
Akazawa H
4681 - 4685 Argon ion beam and electron beam-induced damage in Cu(In,Ga)Se-2 thin films
Yan YF, Jones KM, Noufi R, Al-Jassim MM
4686 - 4690 Fabrication of super-hydrophobic film with dual-size roughness by silica sphere assembly
Sun C, Ge LQ, Gu ZZ
4691 - 4695 Oxidation study of polycrystalline InN film using in situ X-ray scattering and X-ray photoemission spectroscopy
Lee IJ, Yu C, Shin HJ, Kim JY, Lee YP, Hur TB, Kim HK
4696 - 4701 Immersion nickel deposition on blank silicon in aqueous solution containing ammonium fluoride
Zhang X, Chen Z, Tu KN
4702 - 4708 Initial reaction of HfO2 atomic layer deposition on silicon surfaces with different oxygen levels: A density functional theory study
Ren H, Liu FY, Zhang YT, Zhang DW
4709 - 4716 Fixtureless superlayer-driven delamination test for nanoscale thin-film interfaces
Zheng HT, Sitaraman SK
4717 - 4721 Electrochromism of the electroless deposited cuprous oxide films
Neskovska R, Ristova M, Velevska J, Ristov M
4722 - 4726 Characterization of TiCr(C,N)/amorphous carbon coatings synthesized by a cathodic arc deposition process
Chang YY, Yang SJ, Wang DY
4727 - 4737 Enhancement of corrosion resistance of a biomedical grade 316LVM stainless steel by potentiodynamic cyclic polarization
Bou-Saleh Z, Shahryari A, Omanovic S
4738 - 4744 Effect of pressure and substrate temperature on the deposition of nano-structured silicon-carbon-nitride superhard coatings by magnetron sputtering
Mishra SK, Shekhar C, Rupa PKP, Pathak LC
4745 - 4752 A method to evaluate mechanical performance of thin transparent films for flexible displays
Grego S, Lewis J, Vick E, Temple D
4753 - 4757 Photoelectrochemical properties of thin Bi2WO6 films
Zhao X, Wu Y, Yao WQ, Zhu YF
4758 - 4762 Thin film passivation of organic light emitting diodes by inductively coupled plasma chemical vapor deposition
Kim HK, Kim SW, Kim DG, Kang JW, Kim MS, Cho WJ
4763 - 4767 Determination of optical constants and inhomogeneity of optical films by two-step film envelope method
Lai FC, Wang Y, Li M, Wang HQ, Song YZ, Jiang YS
4768 - 4773 Ion beam deposition of alpha-Ta films by nitrogen addition and improvement of diffusion barrier property
Bae JW, Lim JW, Mimura K, Isshiki M
4774 - 4777 Thermally-induced optical property changes of sputtered PdOx films
Arai T, Shima T, Nakano T, Tominaga J
4778 - 4782 Preparation of CuIn1-xGaxSe2 films by metalorganic chemical vapor deposition using three precursors
Choi IH, Lee DH
4783 - 4787 Monitoring interface traps in operating organic light-emitting diodes using impedance spectroscopy
Pingree LSC, Russell MT, Marks TJ, Hersam MC
4788 - 4793 Dielectric properties of sol-gel derived high-k titanium silicate thin films
Sarkar DK, Brassard D, El Khakani MA, Ouellet L
4794 - 4800 Design of diffusion barriers
Gill WN, Plawsky JL
4801 - 4807 Influence of the glycosylphosphatidylinositol anchor in the morphology and roughness of Langmuir-Blodgett films of phospholipids containing alkaline phosphatases
Caseli L, Masui DC, Prazeres R, Furriel M, Leone FA, Zaniquelli MED
4808 - 4811 Degradation characteristics and light-induced effects of polymer thin-film transistors
Liu YR, Peng JB, Laic PT, Yang K, Cao Y
4812 - 4818 Influence of heat treatment on indium-tin-oxide anodes and copper phthalocyanine hole injection layers in organic light-emitting diodes
Fenenko L, Adachi C
4819 - 4825 Deposition characterization of reactive magnetron sputtered aluminum nitride thin films for film bulk acoustic wave resonator
Chiu KH, Chen JH, Chenc HR, Huang RS
4826 - 4833 Characteristic curves of hydrogenated amorphous silicon based solar cells modeled with the defect pool model
Khmovsky E, Sturiale A, Rubinelli FA
4834 - 4837 Influence of thermal annealing on photoluminescence and structural properties of N,N'-diphenyl-N,N'-bis(1-naphthylphenyl)-1, 1'-biphenyl-4,4'-diamine (alpha-NPD) organic thin films
Osipov KA, Pavlovskii VN, Lutsenko EV, Gurskii AL, Yablonskii GP, Hartmann S, Janssen A, Johannes HH, Caspary R, Kowalsky W, Meyer N, Gersdorff A, Heuken A, van Gemmern P, Zimmermann C, Jessen F, Kalisch H, Jansen RH
4838 - 4842 Area selective epitaxy of indium phosphide on silicon (100) substrates without buffer layers by liquid phase epitaxy
Kochiya T, Oyama Y, Sugai M, Nishizawa JI