화학공학소재연구정보센터

Thin Solid Films

Thin Solid Films, Vol.440, No.1-2 Entire volume, number list
ISSN: 0040-6090 (Print) 

In this Issue (43 articles)

1 - 4 Polycrystalline silicon prepared by metal induced crystallization
Choi JH, Kim DY, Kim SS, Park SJ, Jang J
5 - 10 Synthesis and characterization of p-type transparent conducting CuAlO2 thin film by DC sputtering
Banerjee AN, Kundoo S, Chattopadhyay KK
11 - 18 Combinatorial synthesis and rapid characterization of Mo1-xSnx (0 <= x <= 1) thin films
Bonakdarpour A, Hewitt KC, Hatchard TD, Fleischauer MD, Dahn JR
19 - 25 Non-aqueous Electrodeposition of ZnO and CdO films
Jayakrishnan R, Hodes G
26 - 34 Thickness and erbium doping effects on the electrical properties of lead zirconate titanate thin films
Es-Souni M, Zhang N, Iakovlev S, Solterbeck CH, Piorra A
35 - 40 In-plane magnetic anisotropy in RF sputtered Fe-N thin films
Nie HB, Xu SY, Ong CK, Zhan Q, Li DX, Wang JP
41 - 44 Structure of DC sputtered Si-C-N thin films
Radnoczi G, Safran G, Czigany Z, Berlind T, Hultman L
45 - 53 Electrodeposition under a time-dependent boundary condition
Gomez E, Kipervaser ZG, Valles E
54 - 59 Magnetic properties of sputtered soft magnetic Fe-Ni films with an uniaxial anisotropy
Kim JG, Han KH, Song SH, Reilly A
60 - 65 Deposition and dielectric properties of CaCu3Ti4O12 thin films on Pt/Ti/SiO2/Si substrates using pulsed-laser deposition
Fang L, Shen MR
66 - 73 Water as reactive gas to prepare titanium oxynitride thin films by reactive sputtering
Chappe JM, Martin N, Terwagne G, Lintymer J, Gavoille J, Takadoum J
74 - 77 The synthesis by successive ionic layer deposition of SnMo0.O-6(y)center dot nH(2)O nanolayers on silica
Gulina LB, Tolstoy VP
78 - 86 The process window for diamond deposition from the vapor phase with sulfur in the C-H-O feed gas mixtures
Bhimarasetti G, Sunkara MK
87 - 93 Nature of the as-deposited state of AlCuFeCrPVD coatings
Daniels MJ, King D, Phillips B, Zabinski JS, Bilello JC
94 - 99 Temperature-dependent behavior of Langmuir monolayers of an amphiphilic spiropyran
Tachibana H, Yamanaka Y, Abe M
100 - 108 Copper metallization of hydroxyl-modified amorphous Si : C : H films
Pritchett M, Magtoto N, Tong J, Kelber JA, Zhao X
109 - 116 Influence of Si(100) surface pretreatment on the morphology of TiO2 films grown by atomic layer deposition
Finnie KS, Triani G, Short KT, Mitchell DRG, Attard DJ, Bartlett JR, Barbe CJ
117 - 122 Investigation of the interfacial structure of ultra-thin platinum film deposited by cathodic-arc
Swift PD, Solina DM, Cheary RW, McCredie GM
123 - 128 Metallization of cross-linked epoxy resins by reduction of polymer-incorporated metal ions
Shibata M, Uda T, Yosomiya T
129 - 137 Chemical selectivity of self-assembled monolayers of calix[4]resorcinarene
Faull JD, Gupta VK
138 - 144 Thickness of diamond-like carbon coatings quantified with Raman spectroscopy
Scharf TW, Singer IL
145 - 151 Bias frequency, waveform and duty-cycle effects on the bias-enhanced nucleation of epitaxial diamond
Wolter SD, Okuzumi F, Prater JT, Sitar Z
152 - 154 Atomic layer deposition growth of zirconium doped In2O3 films
Asikainen T, Ritala M, Leskela M
155 - 168 Reactive electron beam evaporation of gadolinium oxide optical thin films for ultraviolet and deep ultraviolet laser wavelengths
Sahoo NK, Thakur S, Senthilkumar M, Bhattacharyya D, Das NC
169 - 173 Excimer laser annealed poly-Si thin film transistor with self-aligned lightly doped drain structure
Kim YH, Hwang CS, Song YH, Chung CH, Ko YW, Sohn CY, Kim BC, Lee JH
174 - 179 Recrystallization and grain growth of nanocomposite Ti-B-N coatings
Mayrhofer PH, Willmann H, Mitterer C
180 - 183 Sol-gel broadband anti-reflective single-layer silica films with high laser damage threshold
Yao X, Bing Z, Wen HF, Dong W, Yu HS
184 - 189 Lithographic patterning of benzoylacetone modified SnO2 and SnO2 : Sb thin films
Kololuoma T, Karkkainen AHO, Tolonen A, Rantala JT
190 - 194 Infrared optical properties of Bi2Ti2O7 thin films by spectroscopic ellipsometry
Hu ZG, Wang SW, Huang ZM, Wang GS, Zhang ZH, Lu W, Chu JH
195 - 197 Optimisation of growth temperature and post-growth annealing for GaInNAs/GaNAs/GaAs quantum-well structures emitting at 1.3 mu m
Fedorenko Y, Jouhti T, Pavelescu EM, Karirinne S, Kontinnen J, Pessa M
198 - 207 Surface modification and characterization of photodefinable epoxy/copper systems
Ge J, Turunen MPK, Kivilahti JK
208 - 216 AFM observation of silk fibroin on mica substrates: morphologies reflecting the secondary structures
Yamada K, Tsuboi Y, Itaya A
217 - 222 The structure of multilayer films of DNA-aliphatic amine is preparation technique dependent
Shabarchina LI, Montrel MM, Sukhorukov GB, Sukhorukov BI
223 - 239 Atomic force microscopy studies of lateral phase separation in mixed monolayers of dipalmitoylphosphatidylcholine and dilauroylphosphatidylcholine
Sanchez J, Badia A
240 - 246 Studies on the formation of Langmuir monolayer and Langmuir-Blodgett films of octadecyl amine-bromocresol purple dye complex
Choudhury S, Chitra R, Yakhmi JV
247 - 254 Photo- and electroluminescence properties of fluorene-based copolymers containing electron- or hole-transporting unit
Sun QJ, Zhan XW, Yang CH, Liu YQ, Li YF, Zhu DB
255 - 260 Preparation and nitromethane sensing properties of chitosan thin films containing pyrene and beta-cyclodextrin units
Wang H, Fang Y, Ding LP, Gao LN, Hu DD
261 - 267 Transmission electron microscope study of the topotactic reaction of (001), (011) and (111) Ag films and Te
Safran G, Geszti O, Radnoczi G
268 - 277 Micro-Raman spectroscopy study of surface transformations induced by excimer laser irradiation of TiO2
Robert TD, Laude LD, Geskin VM, Lazzaroni R, Gouttebaron R
278 - 284 Effects of thermal treatment on the electrical and optical properties of silver-based indium tin oxide/metal/indium tin oxide structures
Jung YS, Choi YW, Lee HC, Lee DW
285 - 292 Spontaneous ordering of composition pattern in an epitaxial monolayer by subsurfacial dislocation array
Ni Y, He LH
293 - 293 Ultrathin Pd and Pt films on W(211) (vol 428, pg 47, 2003)
Block J, Kolodziej JJ, Rowe JE, Madey TE, Schroder E
294 - 294 Quantitative analysis of tungsten, oxygen and carbon concentrations in the microcrystalline silicon films deposited by hot-wire CVD (vol 430, pg 110, 2003)
Bouree JE, Guillet J, Grattepain C, Chaumont J