1 - 10 |
Structural characterization of TiO2 films obtained by high temperature oxidation of TiC single crystals Bellucci A, Di Pascasio F, Gozzi D, Loreti S, Minarini C |
11 - 16 |
Electrochromism in sputtered V2O5 thin films: structural and optical studies Benmoussa M, Outzourhit A, Bennouna A, Ameziane EL |
17 - 22 |
Effects of CH4/SiH4 flow ratio and microwave power on the growth of beta-SiC on Si by ECR-CVD using CH4/SiH4/Ar at 200 degrees C Lee WH, Lin JC, Lee C, Cheng HC, Yew TR |
23 - 28 |
Chemical vapor deposition of 6CuO center dot Cu2O films on fiberglass Medina-Valtierra J, Ramirez-Ortiz J, Arroyo-Rojas VM, Bosch P, de los Reyes JA |
29 - 34 |
Vapour-etching-based porous silicon: a new approach Saadoun M, Mliki N, Kaabi H, Daoudi K, Bessais B, Ezzaouia H, Bennaceur R |
35 - 41 |
Optical properties and charge transport in nanocrystalline TiO2-In2O3 composite films Poznyak SK, Talapin DV, Kulak AI |
42 - 49 |
Deposition and characterisation of NbxC60 films Talyzin A, Hogberg H, Jansson U |
50 - 54 |
Optical properties of anatase TiO2 thin films prepared by aqueous sol-gel process at low temperature Wang ZC, Helmersson U, Kall PO |
55 - 63 |
Potential distribution at the semiconductor thin film/electrolyte interface with high density of grain boundaries Alcober C, Bilmes SA |
64 - 72 |
Influence of the sputtering gas on the preferred orientation of nanocrystalline titanium nitride thin films Banerjee R, Chandra R, Ayyub P |
73 - 76 |
The effect of HF vapor pre-treatment on the cobalt salicide process Lee SY, Cao WQ, Lee E, Lo P, Lee SK |
77 - 80 |
Molecular orientation of oligothiophene-based polyamide thin films fabricated by vapor deposition polymerization Muguruma H, Matsumura K, Hotta S |
81 - 86 |
Nanocrystalline Pt thin films, obtained via metal organic chemical vapor deposition on quartz and CaF2 substrates: an investigation of their chemico-physical properties Barison S, Fabrizio M, Carta G, Rossetto G, Zanella P, Barreca D, Tondello E |
87 - 91 |
Oxide thin film deposition on eutectic substrates Santiso J, Laukhin V, Garcia G, Figueras A, Balcells L, Fontcuberta J, Pena JI, Merino RI, Orera VM |
92 - 97 |
Extraordinary Hall effect in Fe-Pt alloy thin films and fabrication of micro Hall devices Watanabe M, Masumoto T |
98 - 103 |
The composite Hall effect of non-magnetic and magnetic bilayers Koon DW, Azofeifa DE, Clark N |
104 - 108 |
Hydrophobic fluorinated carbon coatings on silicate glaze and aluminum Ji H, Cote A, Koshel D, Terreault B, Abel G, Ducharme P, Ross G, Savoie S, Gagne M |
109 - 116 |
Fabrication of ZnO(0001) epitaxial films on the cubic(111) substrate with C-6 symmetry, by pulsed laser ablation Nakamura T, Minoura H, Muto H |
117 - 121 |
Microstructures of LaNiO3 films grown on Si(001) by pulsed laser deposition Kim SS, Kang TS, Je JH |
122 - 128 |
Deposition of epitaxial ternary transition metal carbide films Palmquist JP, Birch J, Jansson U |
129 - 134 |
A voltammetric study of the electrodeposition of CuInSe2 in a citrate electrolyte Oliveira MCF, Azevedo M, Cunha A |
135 - 140 |
Nanoscale morphology of polyelectrolyte self-assembled films probed by scanning force and near-field scanning optical microscopy Lowman GM, Buratto SK |
141 - 145 |
Scanning tunneling microscope observations of Ge deposition on Si(111)-7x7 surfaces irradiated by Xe ions Takaoka GH, Seki T, Tsumura K, Matsuo J |
146 - 152 |
Viscoelastic properties of plasma sprayed NiCoCrAlY coatings Chia CT, Khor KA, Gu YW, Boey F |
153 - 161 |
The voltammetry-photocurrent response study of passivation of carbon steel in slightly alkaline solutions containing the corrosion inhibitor phosphor-polymaleic acid-ZnSO4 Li YJ, Wu B, Zeng XP, Liu YF, Ni YM, Zhou GD, Ge HH |
162 - 169 |
Bias effect of ion-plated zirconium nitride film on Si(100) Chou WJ, Yu GP, Huang JH |
170 - 178 |
Multilayer diffusional growth in silicon-molybdenum interactions Yoon JK, Byun JY, Kim GH, Kim JS, Choi CS |
179 - 185 |
Formation and properties of a carbonitrided layer in 304 stainless steel using different radio frequency plasma powers El-Hossary FM, Negm NZ, Khalil SM, Abd Elrahman AM |
186 - 193 |
X-ray photoelectron spectroscopy study of polycrystalline zinc modified by n-dodecanethiol and 3-perfluorooctyl-propanethiol Mekhalif Z, Massi L, Guittard F, Geribaldi S, Delhalle J |
194 - 197 |
High growth rate deposition of oriented hexagonal InN films Yang FH, Hwang JS, Chen KH, Yang YJ, Lee TH, Hwa LG, Chen LC |
198 - 204 |
Cross-sectional thin film characterization of Si compounds in semiconductor device structures using both elemental and ELNES mapping by EFTEM Worch M, Engelmann HJ, Blum W, Zschech E |
205 - 217 |
Implications of advanced modeling on the observation of Poole-Frenkel effect saturation Harrell WR, Gopalakrishnan C |
218 - 223 |
SIMS characterisation of chemical solution deposited thin film systems of BaTiO3/X (X=LaNiO3, La0.5Sr0.5CoO3, La0.7Sr0.3MnO3) on a platinised silicon wafer Pollak C, Busic A, Reichmann K, Hutter H |
224 - 227 |
Red electroluminescence of a europium complex dispersed in poly(N-vinylcarbazole) Peng JB, Takada N, Minami N |
228 - 233 |
Influence of the concentration of Sb2O3 and the viscosity of the precursor solution on the electrical and optical properties of SnO2 thin films produced by the Pechini method Bernardi MIB, Soledade LE, Santos IA, Leite ER, Longo E, Varela JA |
234 - 237 |
Comparison between vanadium dioxide coatings on glass produced by sputtering, alkoxide and aqueous sol-gel methods Hanlon TJ, Walker RE, Coath JA, Richardson MA |
238 - 242 |
Preparation and optical properties of holmium oxide thin films Wiktorczyk T |
243 - 247 |
Macroscopic field emission properties of aligned carbon nanotubes array and randomly oriented carbon nanotubes layer Wang YH, Lin J, Huan CHA |
248 - 255 |
Homojunction and heterojunction silicon solar cells deposited by low temperature-high frequency plasma enhanced chemical vapour deposition Pla J, Centurioni E, Summonte C, Rizzoli R, Migliori A, Desalvo A, Zignani F |
256 - 262 |
Microstructural evolution and electrical property of Ta-doped SnO2 films grown on Al2O3(0001) by metalorganic chemical vapor deposition Kim YW, Lee SW, Chen H |
263 - 269 |
An apparent n to p transition in reactively sputtered indium-tin-oxide high temperature strain gages Gregory OJ, Luo Q, Bienkiewicz JM, Erwin BM, Crisman EE |
270 - 275 |
Nanostructural characterisation of SnO2 thin films prepared by reactive r.f. magnetron sputtering of tin Gubbins MA, Casey V, Newcomb SB |
276 - 289 |
An approach for fabrication of junctions with Langmuir-Blodgett films incorporated between molecular electrodes Troitsky VI, Berzina TS, Dalcanale E, Fontana MP |
290 - 299 |
Highly reliable gate oxidation using catalytic water vapor generator (WVG) for MOS device fabrication Ohkawa T, Nakamura O, Aharoni H, Ohmi T |
300 - 303 |
Control of frictional force on coating films of boron nitride-copper complex in ultra high vacuum Goto M, Kasahara A, Tosa M, Yoshihara K |
304 - 309 |
Structural and electrical properties of CoxC1-x nanogranular films prepared by pulsed filtered vacuum arc deposition Wang H, Wong SP, Li WQ, Chiah MF, Poon CY, Cheung WY, Ke N |