화학공학소재연구정보센터

Thin Solid Films

Thin Solid Films, Vol.405, No.1-2 Entire volume, number list
ISSN: 0040-6090 (Print) 

In this Issue (46 articles)

1 - 10 Structural characterization of TiO2 films obtained by high temperature oxidation of TiC single crystals
Bellucci A, Di Pascasio F, Gozzi D, Loreti S, Minarini C
11 - 16 Electrochromism in sputtered V2O5 thin films: structural and optical studies
Benmoussa M, Outzourhit A, Bennouna A, Ameziane EL
17 - 22 Effects of CH4/SiH4 flow ratio and microwave power on the growth of beta-SiC on Si by ECR-CVD using CH4/SiH4/Ar at 200 degrees C
Lee WH, Lin JC, Lee C, Cheng HC, Yew TR
23 - 28 Chemical vapor deposition of 6CuO center dot Cu2O films on fiberglass
Medina-Valtierra J, Ramirez-Ortiz J, Arroyo-Rojas VM, Bosch P, de los Reyes JA
29 - 34 Vapour-etching-based porous silicon: a new approach
Saadoun M, Mliki N, Kaabi H, Daoudi K, Bessais B, Ezzaouia H, Bennaceur R
35 - 41 Optical properties and charge transport in nanocrystalline TiO2-In2O3 composite films
Poznyak SK, Talapin DV, Kulak AI
42 - 49 Deposition and characterisation of NbxC60 films
Talyzin A, Hogberg H, Jansson U
50 - 54 Optical properties of anatase TiO2 thin films prepared by aqueous sol-gel process at low temperature
Wang ZC, Helmersson U, Kall PO
55 - 63 Potential distribution at the semiconductor thin film/electrolyte interface with high density of grain boundaries
Alcober C, Bilmes SA
64 - 72 Influence of the sputtering gas on the preferred orientation of nanocrystalline titanium nitride thin films
Banerjee R, Chandra R, Ayyub P
73 - 76 The effect of HF vapor pre-treatment on the cobalt salicide process
Lee SY, Cao WQ, Lee E, Lo P, Lee SK
77 - 80 Molecular orientation of oligothiophene-based polyamide thin films fabricated by vapor deposition polymerization
Muguruma H, Matsumura K, Hotta S
81 - 86 Nanocrystalline Pt thin films, obtained via metal organic chemical vapor deposition on quartz and CaF2 substrates: an investigation of their chemico-physical properties
Barison S, Fabrizio M, Carta G, Rossetto G, Zanella P, Barreca D, Tondello E
87 - 91 Oxide thin film deposition on eutectic substrates
Santiso J, Laukhin V, Garcia G, Figueras A, Balcells L, Fontcuberta J, Pena JI, Merino RI, Orera VM
92 - 97 Extraordinary Hall effect in Fe-Pt alloy thin films and fabrication of micro Hall devices
Watanabe M, Masumoto T
98 - 103 The composite Hall effect of non-magnetic and magnetic bilayers
Koon DW, Azofeifa DE, Clark N
104 - 108 Hydrophobic fluorinated carbon coatings on silicate glaze and aluminum
Ji H, Cote A, Koshel D, Terreault B, Abel G, Ducharme P, Ross G, Savoie S, Gagne M
109 - 116 Fabrication of ZnO(0001) epitaxial films on the cubic(111) substrate with C-6 symmetry, by pulsed laser ablation
Nakamura T, Minoura H, Muto H
117 - 121 Microstructures of LaNiO3 films grown on Si(001) by pulsed laser deposition
Kim SS, Kang TS, Je JH
122 - 128 Deposition of epitaxial ternary transition metal carbide films
Palmquist JP, Birch J, Jansson U
129 - 134 A voltammetric study of the electrodeposition of CuInSe2 in a citrate electrolyte
Oliveira MCF, Azevedo M, Cunha A
135 - 140 Nanoscale morphology of polyelectrolyte self-assembled films probed by scanning force and near-field scanning optical microscopy
Lowman GM, Buratto SK
141 - 145 Scanning tunneling microscope observations of Ge deposition on Si(111)-7x7 surfaces irradiated by Xe ions
Takaoka GH, Seki T, Tsumura K, Matsuo J
146 - 152 Viscoelastic properties of plasma sprayed NiCoCrAlY coatings
Chia CT, Khor KA, Gu YW, Boey F
153 - 161 The voltammetry-photocurrent response study of passivation of carbon steel in slightly alkaline solutions containing the corrosion inhibitor phosphor-polymaleic acid-ZnSO4
Li YJ, Wu B, Zeng XP, Liu YF, Ni YM, Zhou GD, Ge HH
162 - 169 Bias effect of ion-plated zirconium nitride film on Si(100)
Chou WJ, Yu GP, Huang JH
170 - 178 Multilayer diffusional growth in silicon-molybdenum interactions
Yoon JK, Byun JY, Kim GH, Kim JS, Choi CS
179 - 185 Formation and properties of a carbonitrided layer in 304 stainless steel using different radio frequency plasma powers
El-Hossary FM, Negm NZ, Khalil SM, Abd Elrahman AM
186 - 193 X-ray photoelectron spectroscopy study of polycrystalline zinc modified by n-dodecanethiol and 3-perfluorooctyl-propanethiol
Mekhalif Z, Massi L, Guittard F, Geribaldi S, Delhalle J
194 - 197 High growth rate deposition of oriented hexagonal InN films
Yang FH, Hwang JS, Chen KH, Yang YJ, Lee TH, Hwa LG, Chen LC
198 - 204 Cross-sectional thin film characterization of Si compounds in semiconductor device structures using both elemental and ELNES mapping by EFTEM
Worch M, Engelmann HJ, Blum W, Zschech E
205 - 217 Implications of advanced modeling on the observation of Poole-Frenkel effect saturation
Harrell WR, Gopalakrishnan C
218 - 223 SIMS characterisation of chemical solution deposited thin film systems of BaTiO3/X (X=LaNiO3, La0.5Sr0.5CoO3, La0.7Sr0.3MnO3) on a platinised silicon wafer
Pollak C, Busic A, Reichmann K, Hutter H
224 - 227 Red electroluminescence of a europium complex dispersed in poly(N-vinylcarbazole)
Peng JB, Takada N, Minami N
228 - 233 Influence of the concentration of Sb2O3 and the viscosity of the precursor solution on the electrical and optical properties of SnO2 thin films produced by the Pechini method
Bernardi MIB, Soledade LE, Santos IA, Leite ER, Longo E, Varela JA
234 - 237 Comparison between vanadium dioxide coatings on glass produced by sputtering, alkoxide and aqueous sol-gel methods
Hanlon TJ, Walker RE, Coath JA, Richardson MA
238 - 242 Preparation and optical properties of holmium oxide thin films
Wiktorczyk T
243 - 247 Macroscopic field emission properties of aligned carbon nanotubes array and randomly oriented carbon nanotubes layer
Wang YH, Lin J, Huan CHA
248 - 255 Homojunction and heterojunction silicon solar cells deposited by low temperature-high frequency plasma enhanced chemical vapour deposition
Pla J, Centurioni E, Summonte C, Rizzoli R, Migliori A, Desalvo A, Zignani F
256 - 262 Microstructural evolution and electrical property of Ta-doped SnO2 films grown on Al2O3(0001) by metalorganic chemical vapor deposition
Kim YW, Lee SW, Chen H
263 - 269 An apparent n to p transition in reactively sputtered indium-tin-oxide high temperature strain gages
Gregory OJ, Luo Q, Bienkiewicz JM, Erwin BM, Crisman EE
270 - 275 Nanostructural characterisation of SnO2 thin films prepared by reactive r.f. magnetron sputtering of tin
Gubbins MA, Casey V, Newcomb SB
276 - 289 An approach for fabrication of junctions with Langmuir-Blodgett films incorporated between molecular electrodes
Troitsky VI, Berzina TS, Dalcanale E, Fontana MP
290 - 299 Highly reliable gate oxidation using catalytic water vapor generator (WVG) for MOS device fabrication
Ohkawa T, Nakamura O, Aharoni H, Ohmi T
300 - 303 Control of frictional force on coating films of boron nitride-copper complex in ultra high vacuum
Goto M, Kasahara A, Tosa M, Yoshihara K
304 - 309 Structural and electrical properties of CoxC1-x nanogranular films prepared by pulsed filtered vacuum arc deposition
Wang H, Wong SP, Li WQ, Chiah MF, Poon CY, Cheung WY, Ke N