화학공학소재연구정보센터

Thin Solid Films

Thin Solid Films, Vol.390, No.1-2 Entire volume, number list
ISSN: 0040-6090 (Print) 

In this Issue (46 articles)

1 - 6 LiNb1-xTaxO3 films prepared by thermal plasma spray CVD
Yamamoto H, Kulinich SA, Terashima K
7 - 12 Rapid hard tooling by plasma spraying for injection molding and sheet metal forming
Zhang HO, Wang GL, Luo YH, Nakaga T
13 - 19 Numerical simulation of coating growth and pore formation in rapid plasma spray tooling
Chen YX, Wang GL, Zhang HO
20 - 25 Surface modification of titanium oxide in pulse-modulated induction thermal plasma
Ishigaki T, Haneda H, Okada N, Ito S
26 - 30 B-C-N nanotubes prepared by a plasma evaporation method
Moriyoshi Y, Shimizu Y, Watanabe T
31 - 36 Synthesis of fullerenes from carbon powder by using high power induction thermal plasma
Wang C, Imahori T, Tanaka Y, Sakuta T, Takikawa H, Matsuo H
37 - 43 Synthesis of new ceramics from powder mixtures using thermal plasma processing
Fukumasa O
44 - 50 Preparation of ultrafine particles of silicon base intermetallic compound by arc plasma method
Watanabe T, Itoh H, Ishii Y
51 - 58 Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics and influence of the RF bias
Tristant P, Ding Z, Vinh QBT, Hidalgo H, Jauberteau JL, Desmaison J, Dong C
59 - 63 Quantitative modeling of reactive sputtering process for MgO thin film deposition
Matsuda Y, Otomo K, Fujiyama H
64 - 69 Characterization of multilayer films of Ti-Al-O-C-N system prepared by pulsed d.c. plasma-enhanced chemical vapor deposition
Kawata K, Sugimura H, Takai O
70 - 75 Preparation of strontium titanate thin firms by mirror-confinement-type electron cyclotron resonance plasma sputtering
Baba S, Numata K, Saito H, Kumagai M, Ueno T, Kyoh B, Miyake S
76 - 82 Large-area uniform dust-free plasma CVD
Fujiyama H, Maemura Y, Yamaguchi T
83 - 87 Anomalous behavior of electron temperature in silane glow discharge plasmas
Takai M, Nishimoto T, Kondo M, Matsuda A
88 - 92 Reduction of carbon impurities in silicon oxide films prepared by rf plasma-enhanced CVD
Teshima K, Inoue Y, Sugimura H, Takai O
93 - 97 Dissociation process of CH4/H-2 gas mixture during EACVD
Dong LF, Chen JY, Li XW, Zhang LS, Han L, Fu GS
98 - 103 CVD of hard DLC films in a radio frequency inductively coupled plasma source
Yu SJ, Ding ZF, Xu J, Zhang JL, Ma TC
104 - 106 Adhesion improvement of diamond films on cemented carbides with copper implant layer
Ma ZB, Wang JH, Wu QC, Wang CX
107 - 112 Characterization of CNx films prepared by twinned ECR plasma source enhanced DC magnetron sputtering
Xu J, Deng XL, Zhang JL, Lu WQ, Ma TC
113 - 118 A study on the formation and characteristics of the Si-O-C-H composite thin films with low dielectric constant for advanced semiconductor devices
Yang CS, Oh KS, Ryu JY, Kim DC, Shou-Yong J, Choi CK, Lee HJ, Um SH, Chang HY
119 - 122 Localized material growth by a dielectric barrier discharge
Jiang N, Qian SF, Wang L, Zhang HX
123 - 129 Investigation of deposition rate and structure of pulse DC plasma polymers
Zhang J, van Ooij W, France P, Datta S, Radomyselskiy A, Xie HQ
130 - 133 Synthesis of multi-walled carbon nanotubes by microwave plasma-enhanced chemical vapor deposition
Wang XH, Hu Z, Wu Q, Chen X, Chen Y
134 - 138 Surface reaction processes in C4F8 and C5F8 plasmas for selective etching of SiO2 over photo-resist
Motomura H, Imai S, Tachibana K
139 - 144 Dynamic nitrogen and titanium plasma ion implantation/deposition at different bias voltages
Tian XB, Wang LP, Zhan QY, Chu PK
145 - 148 Steady-state direct-current plasma immersion ion implantation using an electron cyclotron resonance plasma source
Zeng XC, Chu PK, Chen QC, Tong HH
149 - 153 Pulsed high energy density plasma processing silicon surface
Liu B, Liu CZ, Cheng DJ, He R, Yang SZ
154 - 158 Oxidative degradation of acridine orange induced by plasma with contact glow discharge electrolysis
Gao JZ, Hu ZG, Wang XY, Hou JG, Lu XQ, Kang JW
159 - 164 Stabilization of chlorofluorocarbons (CFCs) by plasma copolymerization with hydrocarbon monomers
Tsuji O, Minaguchi T, Nakano H
165 - 169 A novel pulsed plasma for chemical conversion
Yao SL, Suzuki E, Nakayama A
170 - 174 Study on mechanism of C-H radicals' recombination into acetylene in the process of coal pyrolysis in hydrogen plasma
Li MD, Fan YS, Dai B, Deng WW, Liu XL
175 - 180 Three-dimensional simulation of a plasma jet with transverse particle and carrier gas injection
Li HP, Chen X
181 - 185 Modeling of the supersonic argon plasma jet at low gas pressure environment
Han P, Chen X
186 - 191 Numerical analysis and experiments on transferred plasma torches for finding appropriate operating conditions and electrode configuration for a waste melting process
Hur M, Hwang TH, Ju WT, Lee CM, Hong SH
192 - 196 Anode mode in cathodic arc deposition apparatus with various cathodes and ambient gases
Miyano R, Saito T, Kimura K, IKeda M, Takikawa H, Sakakibara T
197 - 201 Optical emission patterns and microwave field distributions in a cylindrical microwave plasma source
Fang F, Liang RQ, Ou QR, Sui YF
202 - 207 Production of low electron temperature ECR plasma for plasma processing
Itagaki N, Ueda Y, Ishii N, Kawai Y
208 - 211 Ion and neutral temperatures in an electron cyclotron resonance plasma
Yonesu A, Shinohara S, Yamashiro Y, Kawai Y
212 - 216 Ion-burst method for positive and negative ion species measurements
Yoshimura S, Ichiki R, Shindo M, Kawai Y
217 - 221 Characteristics of VHF excited hydrogen plasmas using a ladder-shaped electrode
Takeuchi Y, Kawasaki I, Mashima H, Murata M, Kawai Y
222 - 227 Estimate of the negative ion density in reactive gas plasmas
Shindo M, Ichiki R, Yoshimura S, Kawai Y
228 - 233 Low-frequency modes in two-dimensional Debye-Yukawa plasma crystals
Wang XG, Liu Y, Bhattacharjee A, Hu SH
234 - 236 Multiple microscale plasma CVD apparatuses on a substrate
Ito T, Terashima K
237 - 242 Dielectric barrier discharge - properties and applications
Xu XJ
243 - 247 Study on formation process of surface plasma
Zhang GQ, Ge YJ, Yang WJ, Zhao ZF
VII - VII Proceedings of the 5th Asia-Pacific Conference on Plasma Science & Technology and the 13th Symposium on Plasma Science for Materials, Dalian, China, 10-13 September, 2000 - Preface
Tachibana K, Watanabe T, Yang XF