화학공학소재연구정보센터

Thin Solid Films

Thin Solid Films, Vol.253, No.1-2 Entire volume, number list
ISSN: 0040-6090 (Print) 

In this Issue (96 articles)

1 - 8 Annealing and Sb-Doping of Sn-O Films Produced by Filtered Vacuum-Arc Deposition - Structure and Electrooptical Properties
Kaplan L, Benshalom A, Boxman RL, Goldsmith S, Rosenberg U, Nathan M
9 - 13 Preparation of Conductive ZnO-Al Films by a Facing Target System with a Strong Magnetic-Field
Tominaga K, Kataoka M, Ueda T, Chong MF, Shintani Y, Mori I
14 - 19 Preparation of Milky Transparent Conducting ZnO Films with Textured Surface by Atmospheric Chemical-Vapor-Deposition Using Zn (C5H7O2)(2)
Minami T, Sato H, Sonohara H, Takata S, Miyata T, Fukuda I
20 - 24 Optical Quantum-Size Effects in Diamond-Like Carbon Superlattice Structures
Silva SR, Amaratunga GA, Rusli, Haq S, Salje EK
25 - 27 Optical Analysis of Complex Multilayer Structures Using Multiple Data-Types
Johs BD, Mcgahan WA, Woollam JA
28 - 32 Laser-Assisted Deposition of Optical Coatings
Thomsenschmidt P, Schafer D, Steiger B, Brausse H, Johansen H, Martini T
33 - 40 Decorative Optical Coatings
Reiners G, Beck U, Jehn HA
41 - 46 Spatially-Resolved Densification of Solution Deposited Zirconium Dioxide Films by Laser Irradiation
Exarhos GJ, Wang LQ, Dennis T
47 - 52 Effects of Ion-Beam Irradiation on the Properties and Epitaxial-Growth of Aluminum Nitride Film by the Ion-Beam-Assisted Deposition Process
Kim IH, Kim SH
53 - 56 Baxsr1-Xtio3 Thin-Films by a Chemical Process
Burhanuddin ZA, Tomar MS, Dayalan E
57 - 61 Modified Forouhi and Bloomer Dispersion Model for the Optical-Constants of Amorphous Hydrogenated Carbon Thin-Films
Mcgahan WA, Makovicka T, Hale J, Woollam JA
62 - 66 Amorphous Si Thin-Films Prepared by Vacuum Arc Deposition
Arbilly D, Boxman RL, Goldsmith S, Rothwarf A, Kaplan L
67 - 71 Characterization of P-Cuga0.25In0.75Se2 N-Zn0.35Cd0.65S Polycrystalline Thin-Film Heterojunctions
Aparna Y, Naidu BS, Reddy PJ
72 - 77 Cross-Sectional Transmission Electron-Microscopy Observations of C-BN Films Deposited on Si by Ion-Beam-Assisted Deposition
Yamashita H, Kuroda K, Saka H, Yamashita N, Watanabe T, Wada T
78 - 84 Synthesis and Structural Characterization of Boron-Nitride Thin-Films
Elena M, Guzman L, Calliari L, Moro L, Steiner A, Miotello A, Bonelli M, Capelletti R, Ossi PM
85 - 89 Physical-Properties of Nitrogenated Amorphous-Carbon Films Produced by Ion-Beam-Assisted Deposition
Rossi F, Andre B, Vanveen A, Mijnarends PE, Schut H, Labohm F, Delplancke MP, Dunlop H, Anger E
90 - 94 Carbon Nitride Formation by Low-Energy Nitrogen Implantation into Graphite
Gouzman I, Brener R, Hoffman A
95 - 102 Diamond Coatings from a Solid Carbon Source
Jou S, Doerr HJ, Bunshah RF
103 - 108 Optimizing the Gas-Phase Chemistry in a DC Arcjet Diamond Chemical-Vapor-Deposition Reactor
Reeve SW, Weimer WA
109 - 113 Deposition of White Diamond Thin-Films by Increasing the Total Pressure in a Microwave-Plasma-Enhanced Chemical-Vapor-Deposition System
Kim SH, Park YS, Lee JW
114 - 118 Nucleation Studies of Thin Diamond Films on Model Substrates
Patscheider J, Oral B
119 - 124 Internal-Stress of Chemical-Vapor-Deposition Diamond Film on Silicon
Chiou YH, Hwang CT, Han MY, Jou JH, Chang YS, Shih HC
125 - 129 Elastic-Modulus of Diamond-Like Carbon-Films Prepared by Pulsed Vacuum-Arc
Schultrich B, Scheibe HJ, Grandremy G, Schneider D, Siemroth P
130 - 135 Effects of Ambient Conditions on the Adhesion of Cubic Boron-Nitride Films on Silicon Substrates
Cardinale GF, Mirkarimi PB, Mccarty KF, Klaus EJ, Medlin DL, Clift WM, Howitt DG
136 - 140 Comparative-Study of Trimethylboron Doping of Hot-Filament Chemically Vapor-Deposited and Microwave Plasma Chemically Vapor-Deposited Diamond Films
Polo MC, Cifre J, Puigdollers J, Esteve J
141 - 145 Electrical-Properties of Diamond Thin-Films Grown by Chemical-Vapor-Deposition Technique
Kulkarni AK, Shrotriya A, Cheng P, Rodrigo H, Bashyam R, Keeble DJ
146 - 150 Use of Space-Charge-Limited Current to Evaluate the Electronic Density-of-States in Diamond-Like Carbon Thin-Films
Silva SR, Amaratunga GA
151 - 156 Fabrication of an Electron Multiplier Utilizing Diamond Films
Mearini GT, Krainsky IL, Wang YX, Dayton JA, Ramesham R, Rose MF
157 - 161 The Effect of Impurities on the Ir Absorption of Chemically Vapor-Deposited Diamond
Mcnamara KM, Scruggs BE, Gleason KK
162 - 167 Optical Characterization of Diamond Synthesized Using CH4-CO2 Gas-Mixtures Without Supplying Hydrogen Gas
Chen CF, Chen SH, Hong TM, Leu JS
168 - 172 Study of the Loss of Pattern Definition in Diamond Growth
Chen CF, Chen SH
173 - 178 Coatings Tribology - A Concept, Critical Aspects and Future-Directions
Holmberg K, Mathews A
179 - 184 Electrostatic-Based Model for Alumina Surfaces
Streitz FH, Mintmire JW
185 - 189 Molecular-Dynamics Simulations of Friction in Self-Assembled Monolayers
Tupper KJ, Brenner DW
190 - 193 Atomic-Scale Friction Measurements on Silver and Chemisorbed Oxygen Surfaces
Mak C, Daly C, Krim J
194 - 198 Triboscopic Description of Local Wear Phenomena Under an AFM Tip
Loubet JL, Belin M, Durand R, Pascal H
199 - 203 Plastic-Deformation in Atomic Size Contacts
Agrait N, Rodrigo JG, Rubio G, Sirvent C, Vieira S
204 - 211 Mechanical Property Characterization of Thin-Films Using Spherical Tipped Indenters
Swain MV, Mencik J
212 - 217 Effects of Activated Reactive Evaporation Process Parameters on the Microhardness of Polycrystalline Silicon-Carbide Thin-Films
Cha YH, Kim G, Doerr HJ, Bunshah RF
218 - 222 Enhanced Mechanical Hardness in Compositionally Modulated Fe(001)/Pt(001) and Fe(001)/Cr(001) Epitaxial Thin-Films
Daniels BJ, Nix WD, Clemens BM
223 - 227 Microstructure and Thermal-Conductivity of Epitaxial AlN Thin-Films
Kuo PK, Auner GW, Wu ZL
228 - 232 Holographic and Spectroscopic Characterization of Spiropyran Doped Poly(Methyl Methacrylate) Films
Xue SS, Manivannan G, Lessard RA
233 - 237 Emittance Characterization of Thermal Control Paints, Coatings and Surfaces Using a Calorimetric Technique
Jaworske DA
238 - 242 Characterization of Thin-Film ZnO/Zncds/Cugase2 Heterojunctions
Reddy KT, Reddy PJ
243 - 246 Characterization of Laser-Ablated Boron-Nitride Thin-Films on Silicon
Pryor RW, Wu ZL, Padmanabhan KR, Villanueva S, Thomas RL
247 - 253 Atmosphere Influence on in-Situ Ion-Beam Analysis of Thin-Film Growth
Lin YP, Krauss AR, Chang RP, Auciello OH, Gruen DM, Schultz JA
254 - 256 Opening and Closing of Channels During Phase-Transitions in Al-Mn Thin-Films
Reyesgasga J, Garcia R
257 - 261 Growth of Low and High Refractive-Index Dielectric Layers as Studied by in-Situ Ellipsometry
Van VN, Fisson S, Frigerio JM, Rivory J, Vuye G, Wang Y, Abeles F
262 - 268 Numerical Ellipsometry - Enhancement of New Algorithms for Real-Time, in-Situ Film Growth Monitoring
Urban FK, Comfort JC
269 - 276 Use of Valence-Band Auger-Electron Spectroscopy to Study Thin-Film Growth - Oxide and Diamond-Like Carbon-Films
Steffen HJ
277 - 284 A New Interpretation of the Binding-Energies in X-Ray Photoelectron Studies of Oxides
Barr TL, Seal S, Chen LM, Kao CC
285 - 292 Effects of Hydrogen Annealing, Sulfur Segregation and Diffusion on the Cyclic Oxidation Resistance of Superalloys - A Review
Smialek JL, Jayne DT, Schaeffer JC, Murphy WH
293 - 298 Interfacial Reactions in Dynamically Heated Si/Me/Si Sandwich Layers
Zalar A, Hofmann S, Pimentel F, Panjan P
299 - 302 Characterization of TiO2/SiO2 Multilayers by High-Resolution Transmission Electron-Microscopy and Electron-Energy-Loss Spectroscopy
Yuzhang K, Boisjolly G, Rivory J, Kilian L, Colliex C
303 - 307 Surface-Morphology Examination of Sol-Gel Deposited TiO2 Films
Anast M, Jamting A, Bell JM, Bennissan B
308 - 310 Aspects of the Surface-Roughness of Ceramic Bonding Tools on a Nanometer-Scale Investigated with Atomic-Force Microscopy
Burger J, Dietler G, Binggeli M, Christoph R, Marti O
311 - 317 Microstructural Investigation of the Kappa-Al2O3-)Alpha-Al2O3 Transformation in Multilayer Coatings of Chemically Vapor-Deposited Kappa-Al2O3
Lindulf N, Halvarsson M, Norden H, Vuorinen S
318 - 325 Advanced Image-Processing in Scanning Probe Microscopy
Urban FK, Romine P, Islam MS
326 - 332 Modeling of Surface-Roughness in Variable-Angle Spectroscopic Ellipsometry, Using Numerical Processing of Atomic-Force Microscopy Images
Urban FK, Athey PR, Islam MS
333 - 338 Photoacoustic Studies of Laser Damage in Oxide Thin-Films
Reichling M, Siegel J, Matthias E, Lauth H, Hacker E
339 - 343 Investigations on N-CdO/P-CdTe Thin Him Heterojunctions
Sravani C, Reddy KT, Hussain OM, Reddy PJ
344 - 348 Microstructure and Mechanical-Properties of Sputtered Platinum Films
Tokura H, Window B, Neely D, Swain M
349 - 355 Residual-Stress in Stabilized Zirconia Thin-Films Prepared by RF Magnetron Sputtering
Scardi P, Polonioli P, Ferrari S
356 - 361 Residual-Stress Distribution in Electroplated Zn-Ni Alloy Layer Determined by X-Ray-Diffraction
Sasaki T, Hirose Y
362 - 366 Pin-Pull Adhesion Measurements of Copper-Films on Ion-Bombarded Alumina
Erck RA
367 - 371 Al Planarization Processes for Multilayer Metallization of Quarter Micrometer Devices
Xu Z, Kieu H, Raaijmakers IJ, Tepman A
372 - 376 The Effects of Collimation on Intrinsic Stress in Sputter-Deposited Metallic Thin-Films
Janacek T, Liu D, Dew SK, Brett MJ, Smy TJ
377 - 381 Formation of Low-Pressure Chemically Vapor-Deposited W-Thin-Film on Silicon Dioxide for Gate Electrode Application
Sone JH, Kim SO, Kim KJ, Kim HS, Kim HJ
382 - 385 Cu Deposition Using a Permanent-Magnet Electron-Cyclotron-Resonance Microwave Plasma Source
Berry LA, Gorbatkin SM, Rhoades RL
386 - 390 Bombardment and Gas Rarefaction Effects on the Properties of Sputtered Ti Thin-Films
Tsai W, Brett MJ, Dew SK, Liu D, Smy T, Tait RN
391 - 394 Selective Electroless Copper Plating on Silicon Seeded by Copper-Ion Implantation
Bhansali S, Sood DK, Zmood RB
395 - 401 Tin-Capped TiSi2 Formation in W/TiSi2 Process for a Quarter-Micron Complementary Metal-Oxide-Semiconductor
Matsubura Y, Sekine M, Kodama N, Noguchi K, Okumura K
402 - 406 Gold and Zinc Thin-Films Deposited by the Ionized Cluster Beam Technique
Feng SW, Nainaparampil JJ, Tabet MF, Urban FK
407 - 412 Au (Ti-W) and Au Cr Metallization of Chemically Vapor-Deposited Diamond Substrates for Multichip-Module Applications
Meyyappan I, Malshe AP, Naseem HA, Brown WD
413 - 418 Electrical-Properties of the P(+)-Gate Electrode of an A-Si/Poly-Si Double-Layer
Kim SO, Kim KJ, Kim HS, Kang SB, Sone JH, Byun JS, Kim HJ
419 - 424 Numerical Simulations of Thin-Film Thermal Flow
Liao H, Cale TS
425 - 429 Properties of Silicon-Nitride Films Prepared by Magnetron Sputtering
Hirohata Y, Shimamoto N, Hino T, Yamashima T, Yabe K
430 - 434 UV-Radiation-Induced Degradation of Fluorinated Polyimide Films
Chang LH, Saha NC
435 - 439 The Effects of Substrate and Annealing Ambient on the Electrical-Properties of Ta2O5 Thin-Films Prepared by Plasma-Enhanced Chemical-Vapor-Deposition
Kim SO, Kim HJ
440 - 444 Comparison of Chemical-Vapor-Deposition of Tin Using Tetrakis-Diethylamino-Titanium and Tetrakis-Dimethylamino-Titanium
Sun SC, Tsai MH
445 - 450 Single-Phase Polycrystalline Ti1-Xwxn Alloys (O-Less-Than-or-Equal-to-X-Less-Than-or-Equal-to-0.7) Grown by UHV Reactive Magnetron Sputtering - Microstructure and Physical-Properties
Moser JH, Tian F, Haller O, Bergstrom DB, Petrov I, Greene JE, Wiemer C
451 - 455 Effect of Dimension Scaling on the Nucleation of C54 TiSi2
Ma Z, Allen LH, Allman DD
456 - 461 Kinetics of Ni/A-Ge Bilayer Reactions
Patterson JK, Park BJ, Ritley K, Xiao HZ, Allen LH, Rockett A
462 - 466 High-Resistivity Co and Ti Silicide Formation on Silicon-on-Insulator Substrates
Hsia SL, Mcguire GE, Tan TY, Smith PL, Lynch WT
467 - 472 Thickness Dependence of the Properties and Thermal-Stability of PtSi Films
Das SR, Sheergar K, Xu DX, Naem A
473 - 478 Chemical-Vapor-Deposition of TiSi2 Using SiH4 and TiCl4
Mendicino MA, Southwell RP, Seebauer EG
479 - 484 Thermal-Stability of Silicide on Polycrystalline Si
Hong QZ, Hong SQ, Dheurle FM, Harper JM
485 - 489 Electrical and Structural-Properties of Buried CoSi2 Layers in Si(100) Grown by Molecular-Beam Allotaxy
Dolle M, Gassig U, Bay HL, Schuppen A, Mantl S
490 - 495 Morphology of Al-Ni-Ge Ohmic Contacts to N-GaAs as a Function of Contact Composition
Lin XW, Lampert WV, Swider W, Haas TW, Holloway PH, Washburn J, Lilientalweber Z
496 - 500 Nonalloyed, Refractory-Metal Contact Optimization with Shallow Implantations of Zn and Mg
Lovejoy ML, Zolper JC, Sherwin ME, Baca AG, Shul RJ, Rieger DJ, Klem JF
501 - 507 Development of a Gate Metal Etch Process for Gallium-Arsenide Wafers
Bammi R, Cale TS, Grivna G
508 - 512 Realistic Electromigration Lifetime Projection of VLSI Interconnects
Kawasaki H, Lee C, Yu TK
513 - 517 Effect of Electro and Stress Migration Forces on the 1/F(Alpha) Noise of Patterned Thin Metal Films
Cottle JG, Klonaris N
518 - 521 Properties of Boron Coatings Used as Plasma-Facing Material of Fusion Device
Hino T, Iwamoto K, Hirohata Y, Yamashina T, Sagara A, Noda N, Inoue N, Kubota Y, Natsir N, Motojima O, Matsuda T, Sogabe T, Kuroda K, Yabe M
522 - 528 Transport Through Multicomponent Dual-Frequency Plasma Sheaths
Myers FR, Peters MW, Ramaswami M, Cale TS
529 - 533 AC Properties of ZnO Thin-Films Prepared by RF Magnetron Sputtering
Mahmood FS, Gould RD