화학공학소재연구정보센터

Journal of Vacuum Science & Technology A

Journal of Vacuum Science & Technology A, Vol.22, No.2 Entire volume, number list
ISSN: 0734-2101 (Print) 

In this Issue (35 articles)

227 - 235 Comparison of pulsed and downstream deposition of fluorocarbon materials from C3F8 and c-C4F8 plasmas
Martin IT, Malkov GS, Butoi CI, Fisher ER
236 - 244 Study of C4F8/CO and C4F8/Ar/CO plasmas for highly selective etching of organosilicate glass over Si3N4 and SiC
Ling L, Hua X, Li X, Oehrlein GS, Celii FG, Kirmse KHR, Jiang P, Wang YC, Anderson HM
245 - 249 Control of nitrogen depth profile in ultrathin oxynitride films formed by pulse-time-modulated nitrogen beams
Samukawa S, Minemura Y, Fukuda S
250 - 254 Preparation of TiN films by arc ion plating using dc and pulsed biases
Huang MD, Lee YP, Dong C, Lin GQ, Sun C, Wen LS
255 - 259 Some considerations on heater design for simultaneous deposition of large-area double-sided high-T-c superconducting thin films
Chen JJ, Tao BW, Liu XZ, Li YR
260 - 263 Plasma characteristics in pulsed direct current reactive magnetron sputtering of aluminum nitride thin films
Lee JW, Cuomo JJ, Bourham M
264 - 271 Reactive physical vapor deposition of TixAlyN: Integrated plasma-surface modeling characterization
Zhang D, Schaeffer JK
272 - 280 Zirconia-alumina nanolaminate for perforated pitting corrosion protection of stainless steel
Gaertner WF, Hoppe EE, Omari MA, Sorbello RS, Aita CR
281 - 286 Phase transformation of tungsten films deposited by diode and inductively coupled plasma magnetron sputtering
Chen GS, Tian HS, Lin CK, Chen GS, Lee HY
287 - 292 Characterization of graded InGaN/GaN epilayers grown on sapphire
Song TL, Chua SJ, Fitzgerald EA, Chen P, Tripathy S
293 - 301 Effects of voltage distribution along an induction coil and discharge frequency in inductively coupled plasmas
Edamura M, Benck EC
302 - 308 Electron cyclotron resonance plasma enhanced metalorganic chemical vapor deposition system with monitoring in situ for epitaxial growth of group-III nitrides
Xu Y, Gu B, Qin FW
309 - 320 Miniaturized vacuum gauges
Wilfert S, Edelman C
321 - 323 Effect of concurrent N-2(+) and N+ ion bombardment on the plasma-assisted deposition of carbon nitride thin film
Cao ZX, Oechsner H
324 - 327 Growth and characterization of cubic CdS epilayers on GaAs substrates
Yu YM, Lee KS, O B, Yu PY, Kim CS, Choi YD, Yun HJ
328 - 331 Easy method enhancing the sensitivity of a helium mass-spectrometer leak detector
Firpo G, Pozzo A
332 - 338 Preferred orientation and film structure of TaN films deposited by reactive magnetron sputtering
Noda S, Tepsanongsuk K, Tsuji Y, Kajikawa Y, Ogawa Y, Komiyama H
339 - 348 High temperature processing of TiO2 thin films for application in silicon solar cells
Richards BS, Richards SR, Boreland MB, Jamieson DN
349 - 355 Effect of deposition parameters on properties of ITO films prepared by reactive middle frequency pulsed dual magnetron sputtering
Rogozin AI, Vinnichenko MV, Kolitsch A, Moller W
356 - 360 Effects of mesh-assisted carbon plasma immersion ion implantation on the surface properties of insulating silicon carbide ceramics
Fu RKY, Fu KL, Tian XB, Chu PK
361 - 365 Thickness dependence of the properties of highly c-axis textured AlN thin films
Martin F, Muralt P, Dubois MA, Pezous A
366 - 370 Effect of ion beam energy on magnetic properties of CoCrPt and CoPt thin films
Zhang JQ, Wang HF, Alex M, Miloslavsky L
371 - 376 Electron beam fluorescence temperature measurements of N-2 in a semiconductor plasma reactor
Shimada M, Cattolica R, Tynan GR
377 - 382 Optical emission diagnostic of a pulsed arc discharge
Restrepo E, Devia A
383 - 394 Analytical modeling of rarefied Poiseuille flow in microchannels
Sun YH, Chan WK
395 - 400 Growth and characterization of hafnium silicate films prepared by UV/ozone oxidation
Punchaipetch P, Pant G, Kim MJ, Wallace RM, Gnade BE
401 - 406 Maximum entropy decomposition of quadrupole mass spectra
Von Toussaint U, Dose V, Golan A
407 - 412 Nonselective and smooth etching of GaN/AlGaN heterostructures by Cl-2/Ar/BCl3 inductively coupled plasmas
Han YJ, Xue S, Wu T, Wu Z, Guo WP, Luo Y, Hao ZB, Sun CZ
413 - 418 Chemical bonds of fluorocarbon films which can be a source of CFx radicals
Takada N, Iida T, Shibagaki K, Sasaki K
419 - 421 Fabrication of iron (III) oxide doped polystyrene shells
Cai PJ, Tang YJ, Zhang L, Du K, Feng CG
422 - 424 Fabrication of ferroelectric PbZrxTi1-xO3 thick films and their optical waveguide properties
Hu GJ, Hu SH, Meng XJ, Wang GS, Zhao Q, Sun JL, Chu JH, Dai N, Xu L, Liu LY, Li DX
425 - 432 Use of gas-phase ethanol to mitigate extreme UV/water oxidation of extreme UV optics
Klebanoff LE, Malinowski ME, Clift WM, Steinhaus C, Grunow P
433 - 436 Mitigation of accumulated electric charge by deposited fluorocarbon film during SiO2 etching
Shimmura T, Suzuki Y, Soda S, Samukawa S, Koyanagi M, Hane K
437 - 440 Trace moisture emissions from heated metal surfaces in hydrogen service
Funke HH, Yao JL, Raynor MW
441 - 441 Etch characteristics of CeO2 thin film in Ar/CF4/Cl-2 plasma (vol 21, pg 426, 2003)
Kim DP, Chang YS, Kim CI