화학공학소재연구정보센터

Journal of the Electrochemical Society

Journal of the Electrochemical Society, Vol.148, No.9 Entire volume, number list
ISSN: 0013-4651 (Print) 

In this Issue (67 articles)

L5 - L5 Structural analysis of submicrometer LiCoO2 films (vol 148, pg A311, 2001)
Bouwman PJ, Boukamp BA, Bouwmeester HJM, Wondergem HJ, Notten PHL
L6 - L6 Spectroscopic studies on electroless deposition of copper on a hydrogen-terminated Si(111) surface in fluoride solutions (vol 148, pg C421, 2001)
Ye S, Inchihara T, Uosaki K
H91 - H97 Passivated luminescent porous silicon
Boukherroub R, Wayner DDM, Lockwood DJ, Canham LT
H98 - H102 Electrochemical NOx sensors based on interfacing nanosized LaFeO3 perovskite-type oxide and ionic conductors
Grilli ML, Di Bartolomeo E, Traversa E
J45 - J49 Structure, luminescence, and transport properties of EuVO4
Li LP, Li GS, Xue YF, Inomata H
J50 - J53 Separation of electronic and ionic contributions to the gain boundary conductivity in acceptor-doped SrTiO3
Guo X, Fleig J, Maier J
A969 - A980 Hysteresis during cycling of nickel hydroxide active material
Srinivasan V, Weidner JW, Newman J
A981 - A983 Layered Li-Co-Mn oxide as a high-voltage positive electrode material for lithium batteries
Kajiyama A, Takada K, Inada T, Kouguchi M, Kondo S, Watanabe M
A984 - A988 Computer simulation of LiPF6 salt association in Li-ion battery electrolyte in the presence of an anion trapping agent
Tasaki K, Nakamura S
A989 - A993 Surface film formation on graphite negative electrode in lithium-ion batteries
Jeong SK, Inaba M, Abe T, Ogumi Z
A994 - A998 Structural changes (degradation) of oxysulfide LiAl0.24Mn1.76O3.98S0.02 spinel on high-temperature cycling
Sun YK, Park GS, Lee YS, Yoashio M, Nahm KS
A999 - A1003 Application of lithium organoborate with salicylic ligand to lithium battery electrolyte
Sasaki Y, Handa M, Kurashima K, Tonuma T, Usami K
B333 - B336 Electrochemical quartz crystal microbalance corrosion sensor for solid metals and metal alloys - Application to the dissolution of 304 stainless steel
Ehahoun H, Gabrielli C, Keddam M, Perrot H, Cetre Y, Diguet L
B337 - B342 Non-thickness-limited growth of anodic oxide films on tantalum
Li YM, Young L
B343 - B347 New rate laws for the growth and reduction of passive films
Macdonald DD, Al Rifaie M, Engelhardt GR
B348 - B356 Electrochemical behavior of thin film analogs of Mg(Zn,Cu,Al)(2)
Ramgopal T, Schmutz P, Frankel GS
B357 - B367 Stress corrosion cracking behavior of alpha-brass as a function of the oxide transport properties in NaNO2 solutions
Malki B, Legris A, Pastol JL, Lorang G, Gorse D
B368 - B375 Hydrogen desorption mechanisms in metastable beta Ti-3 Al-8 V-6 Cr-4 Mo-4 Zr
Koul MG, Scully JR
C569 - C573 Electrochemical preparation of cadmium selenide nanoparticles by the use of molecular templates
Choi SJ, Woo DH, Myung NS, Kang H, Park SM
C574 - C582 Electroless plating of copper and nickel via a Sn-free process on polyimide films modified by surface graft copolymerization with 1-vinylimidazole
Zhang Y, Tan KL, Yang GH, Kang ET, Neoh KG
C583 - C589 Toward the improvement of the microstructure of chemical vapor deposited aluminum on silicon carbide
Vahlas C, Ortiz P, Oquab D, Hall IW
C590 - C598 Displacement activation of tantalum diffusion barrier layer for electroless copper deposition
Hsu HH, Hsieh CC, Chen MH, Lin SJ, Yeh JW
C599 - C603 Temperature-programmed desorption study on the decomposition mechanism of Ti(OC3H7)(4) on Si(100)
Cho SI, Chung CH, Moon SH
C604 - C613 Physicochemical properties of lanthanide and yttrium solutions in fused salts and alloy formation with nickel
Lantelme F, Cartailler T, Berghoute Y, Hamdani M
C614 - C619 Cu electroplating on H-terminated n-Si(111) - Properties and structure of n-Si/Cu junctions
Zambelli T, Munford ML, Pillier F, Bernard MC, Allongue P
C620 - C626 Three-dimensional structuring of electrodeposited Cu-Co multilayer alloys
Kelly JJ, Cantoni M, Landolt D
C627 - C631 Pulsed electrodeposition of nanocrystalline CoNiFe soft magnetic thin films
Nakanishi T, Ozaki M, Nam HS, Yokoshima T, Osaka T
C632 - C639 Real time spectroscopic ellipsometry study on growth processes of ZrO2 thin films in metallorganic chemical vapor deposition
Kubota T, Hara N, Sugimoto K
C640 - C646 Atomic force microscopy-induced nanopatterning of Si(100) surfaces
Santinacci L, Djenizian T, Schmuki P
C647 - C651 Pulsed bipolar electrodeposition of palladium onto graphite powder
Bradley JC, Babu S, Mittal A, Ndungu P, Carroll B, Samuel B
D109 - D111 Conditions for the electrochemical synthesis of the CoPn(3) (Pn = P, As, Sb) skutterudites
DeMattei RC, Watcharapasorn A, Feigelson RS
D112 - D120 Deactivation of thermally formed Ru/Ti oxide electrodes - An AC impedance characterization study
Tilak BV, Birss VI, Wang J, Chen CP, Rangarajan SK
E357 - E363 Characterization of vanadium deposit formation at a hydrogen evolving electrode in alkaline media
Abouatallah RM, Kirk DW, Thorpe SJ, Graydon JW
E364 - E371 The role of the transported entropy of lead ions in partially thermostated and adiabatic cells
Blinov V, Kjelstrup S, Bedeaux D, Sharivker V
E372 - E377 Proton transport in membranes prepared from sulfonated polystyrene-poly(vinylidene fluoride) blends
Lopez ML, Compan V, Garrido J, Riande E, Acosta JL
E378 - E381 Effect of TiCl4 treatment on photoelectrochemical properties of nanocrystalline CdS particulate films
Moon SJ, So WW, Chang HY
E382 - E385 Ionic mobility measurements applying a controlled direct electric field on pulsed gradient spin echo nuclear magnetic resonance
Saito Y, Kataok H, Deki S
E386 - E393 Reduction of nitric acid to hydroxylamine at glassy carbon surfaces modified by the reduction of p-phenylenediamine and p-aminophenol in 1.0 M nitric acid - A scanning electrochemical microscopy study
Halaoui LI, Sharifian H, Bard AJ
F175 - F179 Heat and moisture resistance of siloxane-based low-dielectric-constant materials
Furusawa T, Ryuzaki D, Yoneyama R, Homma Y, Hinode K
F180 - F183 Resistance degradation of lead magnesium niobate-based ceramics during nickel electroplating and recovery through air annealing
Cao JL, Li LT, Wang YL, Gui ZL
F184 - F188 The effect of surface treatments and growth conditions on electrical characteristics of thick (> 50 nm) gate oxides
Wu CT, Ridley R, Roman P, Dolny G, Grebs T, Hao J, Ruzyllo J
F189 - F193 Effects of TiN deposition on the characteristics of W/TiN/SiO2/Si metal oxide semiconductor capacitors
Park DG, Cho HJ, Lim KY, Cha TH, Yeo IS, Park JW
G465 - G471 Atomic layer deposition of AlOx for thin film head gap applications
Paranjpe A, Gopinath S, Omstead T, Bubber R
G472 - G474 Utilization of optical emission spectroscopy for end-point detection during AlGaAs/GaAs and InGaP/GaAs etching in BCl3/N-2 inductively coupled plasmas
Lee JW, Jeon MH, Cho GS, Yim HC, Chang SK, Kim KK, Devre M, Lee YS, Westerman R, Johnson D, Sasserath JN, Pearton SJ
G475 - G480 Finite difference analysis of radial phosphorus dopant distribution in Czochralski-grown silicon single crystals
Sugawara K, Ozeki K, Fujioka K, Mamada Y, Igai M, Hirayama H
G481 - G486 Surface segregation of Al of the bilayers of pure Cu and Cu-Al alloy films
Wang PI, Murarka SP, Kaminski DA, Bedell S, Lanford WA
G487 - G493 The application of ozone in semiconductor cleaning processes -The solubility issue
De Smedt F, De Gendt S, Heyns MM, Vinckier C
G494 - G499 Development of aluminum chemical mechanical planarization
Ronay M
G500 - G506 Thermal stability of sputtered tungsten carbide as diffusion barrier for copper metallization
Wang SJ, Tsai HY, Sun SC, Shiao MH
G507 - G512 Diode analysis of high-energy boron implantation-induced P-well defects
Poyai A, Simoen E, Claeys C, Rooyackers R, Badenes G
G513 - G516 Enhancement of semiconductor wafer cleaning by chelating agent addition
Gale GW, Rath DL, Cooper EI, Estes S, Okorn-Schmidt HF, Brigante J, Jagannathan R, Settembre G, Adams E
G517 - G523 Investigation of Czochralski silicon grown with different interstitial oxygen concentrations and point defect populations
Sama S, Porrini M, Fogale F, Servidori M
G524 - G529 Chlorine plasma/copper reaction in a new copper dry etching process
Lee S, Kuo Y
G530 - G533 Improvements in both thermal stability of Ni-silicide and electrical reliability of gate oxides using a stacked polysilicon gate structure
Lee JW, Lin SX, Lei TF, Lee CL
H103 - H108 Light emission life-span characteristics of electroluminescent phosphor encapsulated by TiOx and SiOx films
Sawada M, Yamaguchi K, Momose K, Saka H
H109 - H114 Low voltage cathodoluminescent characteristics of spherical zinc aluminogallate phosphors
Yoo YK, Hong GY, Cho SH, Yoo JS
H115 - H119 Crystallization of amorphous silicon thin films using a viscous nickel solution
Ahn JH, Ahn BT
H120 - H127 Vapor-phase fuming sulfuric acid-doped poly(p-phenylene vinylene) as a potential humidity sensor
Shah HV, Hanson EL, Arbuckle-Keil GA
H128 - H131 Spherical BaMgAl10O17 : Eu2+ phosphor prepared by aerosol pyrolysis technique for PDP applications
Jeon BS, Hong GY, Yoo YK, Yoo JS
H132 - H138 Current-voltage characteristics of various metal electrodes a in limiting-current-type zirconia cells - Application to hydrocarbon sensors
Takeuchi T, Watanabe S, Hatano Y, Kuwano M, Eguchi Y, Yoshida K, Ishihara T, Takita Y
A1004 - A1014 On the mechanisms of reversible magnesium deposition processes
Aurbach D, Schechter A, Moshkovich M, Cohen Y
A1015 - A1022 Effect of the Co3O4 introduction in the pseudocapacitive behavior of IrO2-based electrode
Grupioni AAF, Lassali TAF
A1023 - A1028 Charge performance of a commercial nickel metal hydride traction battery system
Yang XG, Liaw BY
A1029 - A1033 A study of capacity fade in cylindrical and prismatic lithium-ion batteries
Rubino RS, Gan H, Takeuchi ES
A1034 - A1040 Behavior of CoO-NiO solid solution in molten carbonate
Takizawa K, Hagiwara A
A1041 - A1044 Development of AB(2)-Type Zr-Ti-Mn-V-Ni-M hydride electrode for Ni-MH secondary battery
Song MY, Ahn D, Kwon IH, Chough SH
A1045 - A1050 Li insertion into Li-Ti-O spinels: Voltammetric and electrochemical impedance spectroscopy study
Krtil P, Fattakhova D