화학공학소재연구정보센터
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No. Article
981 Plasma-Etching and Deposition for A-Si-H Thin-Film Transistors
Kuo Y
Journal of the Electrochemical Society, 142(7), 2486, 1995
982 Hydrogen Oxidation on Gas-Diffusion Electrodes for Phosphoric-Acid Fuel-Cells in the Presence of Carbon-Monoxide and Oxygen
Xiao G, Li QF, Hjuler HA, Bjerrum NJ
Journal of the Electrochemical Society, 142(9), 2890, 1995
983 Ionic-Conductivity Enhancement of the Fluoride Conductor CaF2 by Grain-Boundary Activation Using Lewis-Acids
Saito Y, Maier J
Journal of the Electrochemical Society, 142(9), 3078, 1995
984 Low-Temperature Activation and Recrystallization of B+-Implanted and Bf2+-Implanted LPCVD Amorphous-Si Films
Cheng HC, Wang FS, Huang YF, Huang CY, Tsai MJ
Journal of the Electrochemical Society, 142(10), 3574, 1995
985 Surface-Topography of Phosphorus-Doped Polysilicon
Hegde RI, Paulson WM, Tobin PJ
Journal of Vacuum Science & Technology B, 13(4), 1434, 1995
986 Metal Nanotubule Membranes with Electrochemically Switchable Ion-Transport Selectivity
Nishizawa M, Menon VP, Martin CR
Science, 268(5211), 700, 1995
987 Defect Chemistry in Heterogeneous Systems
Maier J
Solid State Ionics, 75, 139, 1995
988 Conduction Mechanisms in RuO2-Glass Composites
Nicoloso N, Lecorrefrisch A, Maier J, Brook RJ
Solid State Ionics, 75, 211, 1995
989 Microcrystalline Structure of Poly-Si Films Prepared by Cathode-Type RF Glow-Discharge
Jayatissa AH, Suzuki M, Nakanishi Y, Hatanaka Y
Thin Solid Films, 256(1-2), 234, 1995
990 Deposition of Thick Doped Polysilicon Films with Low-Stress in an Epitaxial Reactor for Surface Micromachining Applications
Kirsten M, Wenk B, Ericson F, Schweitz JA, Riethmuller W, Lange P
Thin Solid Films, 259(2), 181, 1995