검색결과 : 1,012건
No. | Article |
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941 |
A Reduced-Fluid Dynamic Discharge Model for Applications in Technology-Oriented Computer-Aided-Design Brinkmann RP, Furst R, Werner C, Hierlemann M Journal of the Electrochemical Society, 143(6), 1940, 1996 |
942 |
Synthesis of Silicon-Nitride Particles in Pulsed Radio-Frequency Plasmas Buss RJ, Babu SV Journal of Vacuum Science & Technology A, 14(2), 577, 1996 |
943 |
Detection of Dust Particles in the Plasma by Laser-Induced Heating Stoffels WW, Stoffels E, Kroesen GM, Dehoog FJ Journal of Vacuum Science & Technology A, 14(2), 588, 1996 |
944 |
Optimization of Selective TiSi2 Chemical-Vapor-Deposition by Mechanistic Chemical-Kinetics Southwell RP, Mendicino MA, Seebauer EG Journal of Vacuum Science & Technology A, 14(3), 928, 1996 |
945 |
Interaction of SiH4 with Si(100)2X1 and with Si(111)7X7 at 690 K - A Comparative Scanning-Tunneling-Microscopy Study Fehrenbacher M, Spitzmuller J, Memmert U, Rauscher H, Behm RJ Journal of Vacuum Science & Technology A, 14(3), 1499, 1996 |
946 |
Reactor Modeling for Radio-Frequency Plasma Deposition of Sinxhy - Comparison Between 2 Reactor Designs Caquineau H, Dupont G, Despax B, Couderc JP Journal of Vacuum Science & Technology A, 14(4), 2071, 1996 |
947 |
Ion-Surface Interactions in Low-Temperature Silicon Epitaxy by Remote Plasma-Enhanced Chemical-Vapor-Deposition Habermehl S, Lucovsky G Journal of Vacuum Science & Technology A, 14(6), 3024, 1996 |
948 |
Simulation-Model to Very-Low Pressure Chemical-Vapor-Deposition of SiGe Alloy Gu SL, Wang RH, Zhang R, Zheng YD Journal of Vacuum Science & Technology A, 14(6), 3256, 1996 |
949 |
Epitaxial-Growth of Si1-X-Ygexcy Alloy Layers on (100)Si by Rapid Thermal Chemical-Vapor-Deposition Using Methylsilane Mi J, Warren P, Gailhanou M, Ganiere JD, Dutoit M, Jouneau PH, Houriet R Journal of Vacuum Science & Technology B, 14(3), 1660, 1996 |
950 |
Theoretical Investigation of the Origins of Abrupt Thermochromism in the Polysilanes Gahimer T, Welsh WJ Polymer, 37(10), 1815, 1996 |