화학공학소재연구정보센터
검색결과 : 87건
No. Article
81 Oxynitridation of Silicon and Postnitridation of Thermal Silicon-Oxide in N2O in a Vertical Furnace
Lange P, Boness H, Hendriks M
Journal of the Electrochemical Society, 144(10), 3650, 1997
82 Preparation of Low-Temperature Fluorinated Oxides by Anodic-Oxidation in Dilute Hydrofluosilicic Acid (H2Sif6) Solution
Jen MJ, Hwu JG
Journal of Vacuum Science & Technology A, 15(2), 369, 1997
83 Silicon-Nitride and Oxynitride Deposition by RT-LPCVD
Semmache B, Lemiti M, Chaneliere C, Dubois C, Sibai A, Canut B, Laugier A
Thin Solid Films, 296(1-2), 32, 1997
84 Integrated Processing of Silicon Oxynitride Films by Combined Plasma and Rapid-Thermal Processing
Hattangady SV, Niimi H, Lucovsky G
Journal of Vacuum Science & Technology A, 14(6), 3017, 1996
85 Reliability of Nitrided Si-SiO2 Interfaces Formed by a New, Low-Temperature, Remote-Plasma Process
Lee DR, Parker CG, Hauser J, Lucovsky G
Journal of Vacuum Science & Technology B, 13(4), 1788, 1995
86 Growth-Rate and Characterization of Silicon-Oxide Films Grown in N2O Atmosphere in a Rapid Thermal Processor
Lange P, Bernt H, Hartmannsgruber E, Naumann F
Journal of the Electrochemical Society, 141(1), 259, 1994
87 Some Preliminary-Observations of the Rapid Thermal-Oxidation of Porous Silicon, and the Rapid Thermal Nitriding of Oxidized Porous Silicon
Shieh SY, Evans JW
Journal of Vacuum Science & Technology B, 12(3), 1422, 1994