81 |
Decomposition of Toluene in a Plasma Catalysis System with NiO, MnO2, CeO2, Fe2O3, and CuO Catalysts Wu JL, Huang YX, Xia QB, Li Z Plasma Chemistry and Plasma Processing, 33(6), 1073, 2013 |
82 |
Low pressure oxygen direct current discharges with ion conducting yttria stabilized zirconia electrodes Steinmuller SO, Rohnke M, Janek J Solid State Ionics, 245, 24, 2013 |
83 |
Plasma-catalytic dry reforming of methane in an atmospheric dielectric barrier discharge: Understanding the synergistic effect at low temperature Tu X, Whitehead JC Applied Catalysis B: Environmental, 125, 439, 2012 |
84 |
Plasma-assisted methane reduction of a NiO catalyst-Low temperature activation of methane and formation of carbon nanofibres Gallon HJ, Tu X, Twigg MV, Whitehead JC Applied Catalysis B: Environmental, 106(3-4), 616, 2011 |
85 |
Application of atmospheric non thermal plasma-catalysis hybrid system for air pollution control: Toluene removal An HTQ, Huu TP, Le Van T, Cormier JM, Khacef A Catalysis Today, 176(1), 474, 2011 |
86 |
Non-thermal plasmas for non-catalytic and catalytic VOC abatement Vandenbroucke AM, Morent R, De Geyter N, Leys C Journal of Hazardous Materials, 195, 30, 2011 |
87 |
The roles of various plasma species in the plasma and plasma-catalytic removal of low-concentration formaldehyde in air Fan X, Zhu TL, Sun YF, Yan X Journal of Hazardous Materials, 196, 380, 2011 |
88 |
Byproducts and pathways of toluene destruction via plasma-catalysis Huang HB, Ye DQ, Leung DYC, Feng FD, Guan XJ Journal of Molecular Catalysis A-Chemical, 336(1-2), 87, 2011 |
89 |
Non-Oxidative Reforming of Methane in a Mini-Gliding Arc Discharge Reactor: Effects of Feed Methane Concentration, Feed Flow Rate, Electrode Gap Distance, Residence Time, and Catalyst Distance Rueangjitt N, Sreethawong T, Chavadej S, Sekiguchi H Plasma Chemistry and Plasma Processing, 31(4), 517, 2011 |
90 |
Removal of C3F8 Via the Combination of Non-Thermal Plasma, Adsorption and Catalysis Lin BY, Chang MB, Chen HL, Lee HM, Yu SJ, Li SN Plasma Chemistry and Plasma Processing, 31(4), 585, 2011 |