화학공학소재연구정보센터
검색결과 : 104건
No. Article
81 Electrical transport phenomena in aromatic hydrocarbon polymer
Liu PT, Chang TC, Yan ST, Li CH, Sze SM
Journal of the Electrochemical Society, 150(2), F7, 2003
82 Structural and electrical characteristics of low-dielectric constant porous hydrogen silsesquioxane for Cu metallization
Wang JH, Chen WJ, Chang TC, Liu PT, Cheng SL, Lin JY, Chen LJ
Journal of the Electrochemical Society, 150(8), F141, 2003
83 Effective strategy for porous organosilicate to suppress oxygen ashing damage
Liu PT, Chang TC, Mor YS, Chen CW, Tsai TM, Chu CJ, Pan FM, Sze SM
Electrochemical and Solid State Letters, 5(3), G11, 2002
84 Recovering dielectric loss of low dielectric constant organic siloxane during the photoresist removal process
Chang TC, Mor YS, Liu PT, Tsai TM, Chen CW, Mei YJ, Sze SM
Journal of the Electrochemical Society, 149(8), F81, 2002
85 Trimethylchlorosilane treatment of ultralow dielectric constant material after photoresist removal processing
Chang TC, Mor YS, Liu PT, Tsai TM, Chen CW, Chu CJ, Pan FM, Lur W, Sze SM
Journal of the Electrochemical Society, 149(10), F145, 2002
86 Effective repair to ultra-low-k dielectric material (k-2.0) by hexamethyidisilazane treatment
Mor YS, Chang TC, Liu PT, Tsai TM, Chen CW, Yan ST, Chu CJ, Wu WF, Pan FM, Lur W, Sze SM
Journal of Vacuum Science & Technology B, 20(4), 1334, 2002
87 Eliminating dielectric degradation of low-k organosilicate glass by trimethylchlorosilane treatment
Chang TC, Liu PT, Mor YS, Tsai TM, Chen CW, Mei YJ, Pan FM, Wu WF, Sze SM
Journal of Vacuum Science & Technology B, 20(4), 1561, 2002
88 Characterization of porous silicate for ultra-low k dielectric application
Liu PT, Chang TC, Hsu KC, Tseng TY, Chen LM, Wang CJ, Sze SM
Thin Solid Films, 414(1), 1, 2002
89 Electrical properties of metal-ferroelectric-insulator-semiconductor using sol-gel derived SrBi2Ta2O9 film and ultra-thin Si3N4 buffer layer
Huang CH, Tseng TY, Chien CH, Yang MJ, Leu CC, Chang TC, Liu PT, Huang TY
Thin Solid Films, 420-421, 377, 2002
90 The novel pattern method of low-k hybrid-organic-siloxane-polymer film using X-ray exposure
Chang TC, Tsai TM, Liu PT, Mor YS, Chen CW, Mei YJ, Sheu JT, Tseng TY
Thin Solid Films, 420-421, 403, 2002