검색결과 : 174건
No. | Article |
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81 |
Effects of Surface Forces on Material Removal Rate in Chemical Mechanical Planarization Bozkaya D, Muftu S Journal of the Electrochemical Society, 157(3), H287, 2010 |
82 |
1H-Benzotriazole Incorporated Pad for Chemical Mechanical Planarization of Copper Yu JF, Jia DM, Venkataraman SS, Li YZ Journal of the Electrochemical Society, 157(3), H312, 2010 |
83 |
Effects of Addition of Resin Particles to Ceria-Based Slurry on Pre-Metal Dielectric Planarization Matsui Y, Eda H, Seta S, Ono T, Tateyama Y, Nishioka T, Yano H, Masuko M Journal of the Electrochemical Society, 157(5), H510, 2010 |
84 |
Study on Stiffness and Conditioning Effects of CMP Pad Based on Physical Die-Level CMP Model Fan W, Boning D, Charns L, Miyauchi H, Tano H, Tsuji S Journal of the Electrochemical Society, 157(5), H526, 2010 |
85 |
Effects of He Plasma Pretreatment on Low-k Damage during Cu Surface Cleaning with NH3 Plasma Urbanowicz AM, Shamiryan D, Zaka A, Verdonck P, De Gendt S, Baklanov MR Journal of the Electrochemical Society, 157(5), H565, 2010 |
86 |
Effect of copper barrier dielectric deposition process on characterization of copper interconnect Cheng YL, Chiu TJ, Wei BJ, Wang HJ, Wu J, Wang YL Journal of Vacuum Science & Technology B, 28(3), 567, 2010 |
87 |
InAlN/GaN heterostructure field-effect transistors on Fe-doped semi-insulating GaN substrates Wu M, Leach JH, Ni X, Li X, Xie J, Dogan S, Ozgur U, Morkoc H, Paskova T, Preble E, Evans KR, Lu CZ Journal of Vacuum Science & Technology B, 28(5), 908, 2010 |
88 |
Texture investigation in the trench depth direction of very fine copper wires less than 100 nm wide using electron backscatter diffraction Khoo K, Onuki J Thin Solid Films, 518(12), 3413, 2010 |
89 |
Chemical mechanical polishing of hard disk substrate with alpha-alumina-g-polystyrene sulfonic acid composite abrasive Lei H, Bu NJ, Chen RL, Hao P, Neng SM, Tu XF, Yuen K Thin Solid Films, 518(14), 3792, 2010 |
90 |
Mechanism of high selectivity in ceria based shallow trench isolation chemical mechanical polishing slurries Manivannan R, Victoria SN, Ramanathan S Thin Solid Films, 518(20), 5737, 2010 |