화학공학소재연구정보센터
검색결과 : 26,758건
No. Article
71 Peculiarities of Phase Formation Processes in Activated Ti plus Al Powder Mixture during Transition from Combustion Synthesis to High-temperature Annealing
Filimonov VY, Loginova MV, Ivanov SG, Sitnikov AA, Yakovlev VI, Sobachkin AV, Negodyaev AZ, Myasnikov AY
Combustion Science and Technology, 192(3), 457, 2020
72 Study of n-Butylcyclohexane/Air Ignition over a Broad Range of Temperatures in Shock Tube
Zhang DX, Wang YJ, Wan ZJ, Li P, Zhang CH
Combustion Science and Technology, 192(3), 547, 2020
73 The Speed and Temperature of an Edge Flame Stabilized in a Mixing Layer: Dependence on Fuel Properties and Local Mixture Fraction Gradient
Lu ZB, Matalon M
Combustion Science and Technology, 192(7), 1274, 2020
74 Study on the thermoelectric properties of porous Bi-Te films deposited using thermal evaporation on AAO template
Liu SY, Li GJ, Lan MD, Piao YJ, Zhang YN, Wang Q
Current Applied Physics, 20(3), 400, 2020
75 Flexible NiO nanocrystal-based resistive memory device fabricated by low-temperature solution-process
Yun HW, Woo HK, Oh SJ, Hong SH
Current Applied Physics, 20(2), 288, 2020
76 Improvement of the electron transport behavior in quantum-dot light-emitting diodes using a low-temperature processable ZnO
Yu JH, Heo SB, Shin JS, Kang SJ
Current Applied Physics, 20(2), 366, 2020
77 Enhancing fully printable mesoscopic perovskite solar cell performance using integrated metallic grids to improve carbon electrode conductivity
Raptis D, Stoichkov V, Meroni SMP, Pockett A, Worsley CA, Carnie M, Worsley DA, Watson T
Current Applied Physics, 20(5), 619, 2020
78 Modeling and simulation of planar SOFC to study the electrochemical properties
Hussain J, Ali R, Akhtar MN, Jaffery MH, Shakir I, Raza R
Current Applied Physics, 20(5), 660, 2020
79 Cell viability and measurement of reactive species in gas- and liquid-phase exposed by a microwave-excited atmospheric pressure argon plasma jet
Jo A, Joh HM, Chung JW, Chung TH
Current Applied Physics, 20(4), 562, 2020
80 Highly frequency-, temperature-, and bias -stable dielectric properties of 500 degrees C processed Bi2SiO5 thin films with low dielectric loss
Ke YF, Huang WH, Thatikonda SK, Chen RQ, Yao CY, Qin N, Bao DH
Current Applied Physics, 20(6), 751, 2020