화학공학소재연구정보센터
검색결과 : 158건
No. Article
71 Structural studies on vacuum evaporated ZnSe/p-Si Schottky diodes
Venkatachalam S, Mangalaraj D, Narayandass SK, Velumani S, Schabes-Retchkiman P, Ascencio JA
Materials Chemistry and Physics, 103(2-3), 305, 2007
72 Stoichiometric SiO2 thin films deposited by reactive sputtering
Radovic I, Serruys Y, Limoge Y, Bibic N, Poissonnet S, Jaoul O, Mitri M, Romevi N, Milosavljevic M
Materials Chemistry and Physics, 104(1), 172, 2007
73 Characterization of iridium oxide thin films deposited by pulsed-direct-current reactive sputtering
Thanawala S, Georgiev DG, Baird RJ, Auner G
Thin Solid Films, 515(18), 7059, 2007
74 Elemental depth profiling of a-Si1-xGex : H films by elastic recoil detection analysis and secondary ion mass spectrometry
Mikami A, Takagawa T, Nishio K, Ogawa H, Okazawa T, Kido Y
Applied Surface Science, 252(14), 5124, 2006
75 SIMS quantitative depth profiling of matrix elements in semiconductor layers
Guryanov G, Clair TPS, Bhat R, Caneau C, Nikishin S, Borisov B, Budrevich A
Applied Surface Science, 252(19), 7208, 2006
76 Quantitative SIMS analysis of SiGe composition with low energy O-2(+) beams
Jiang ZX, Kim K, Lerma J, Corbett A, Sieloff D, Kottke M, Gregory R, Schauer S
Applied Surface Science, 252(19), 7262, 2006
77 Ion implantation induced by Cu ablation at high laser fluence
Torrisi L, Mezzasalma AM, Gammino S, Badziak J, Parys P, Wolowski J, Laska L, Franco G
Applied Surface Science, 252(24), 8533, 2006
78 Carbon monoxide oxidation over well-defined Pt/ZrO2 model catalysts: Bridging the material gap
Wootsch A, Descorme C, Rousselet S, Duprez D, Ternplier C
Applied Surface Science, 253(3), 1310, 2006
79 Electroless copper on refractory and noble metal substrates with an ultra-thin plasma-assisted atomic layer deposited palladium layer
Kim YS, Kim HI, Cho JH, Seo HK, Dar MA, Shin HS, Ten Eyck GA, Lu TM, Senkevich JJ
Electrochimica Acta, 51(12), 2400, 2006
80 Development of an environmentally friendly protective coating for the depleted uranium-0.75 wt% titanium alloy - Part III: Surface analysis of the coating
Roeper DF, Chidambaram D, Clayton CR, Halada GP, Demaree JD
Electrochimica Acta, 51(19), 3895, 2006