화학공학소재연구정보센터
검색결과 : 96건
No. Article
71 Effect of interfacial interactions on the initial growth of Cu on clean SiO2 and 3-mercaptopropyltrimethoxysilane-modified SiO2 substrates
Hu M, Noda S, Tsuji Y, Okubo T, Yamaguchi Y, Komiyama H
Journal of Vacuum Science & Technology A, 20(3), 589, 2002
72 Structure and morphology of self-assembled 3-mercaptopropyltrimethoxysilane layers on silicon oxide
Hu MH, Noda S, Okubo T, Yamaguchi Y, Komiyama H
Applied Surface Science, 181(3-4), 307, 2001
73 NO reduction under the excess O-2 condition by porous VYCOR catalyst
Yamamoto M, Ona S, Noda S, Sadakata M
Journal of Chemical Engineering of Japan, 34(6), 834, 2001
74 Growth of Pt crystallites supported on gamma-Al2O3 studied by atomic force microscopy
Okumura K, Hyodo S, Noda S
Journal of Physical Chemistry B, 105(35), 8345, 2001
75 Influence of deposition temperature on the microstructure of Pb-Ti-Nb-O thin films by metallorganic chemical vapor deposition
Liu XD, Funakubo H, Noda S, Komiyama H
Journal of the Electrochemical Society, 148(3), C227, 2001
76 Myocilin expression in the astrocytes of the optic nerve head
Noda S, Mashima Y, Obazawa M, Kubota R, Oguchi Y, Kudoh J, Minoshima S, Shimizu N
Biochemical and Biophysical Research Communications, 276(3), 1129, 2000
77 Development of selective noncatalytic reduction by ammonia in the presence of phenol
Noda S, Harano A, Hashimoto M, Sadakata M
Combustion and Flame, 122(4), 439, 2000
78 Difference of anisotropic structures of InAs/GaAs quantum dots between organometallic vapor-phase epitaxy and molecular beam epitaxy
Furukawa Y, Noda S
Journal of Crystal Growth, 220(4), 425, 2000
79 Investigation of ion transportation in high-aspect-ratio holes from fluorocarbon plasma for SiO2 etching
Noda S, Ozawa N, Kinoshita T, Tsuboi H, Kawashima K, Hikosaka Y, Kinoshita K, Sekine M
Thin Solid Films, 374(2), 181, 2000
80 Gas-phase hydroxyl radical emission in the thermal decomposition of lithium hydroxide
Noda S, Nishioka M, Sadakata M
Journal of Physical Chemistry B, 103(11), 1954, 1999